Silicon Dioxide

Silicon Dioxide Sputtering Target Overview

Silicon Dioxide sputtering targets are high-purity ceramic targets suitable for the preparation of functional thin films and protective coatings. They are widely used in the sputtering deposition of optical thin films, electronic devices, and protective coatings.

We can provide process-compatible Silicon Dioxide sputtering targets and support technical integration of target structure and deposition parameters. Contact us now!

Product Highlights

Uniform and stable film composition
High thermal stability
Excellent deposition uniformity
Strong process compatibility
Suitable for various sputtering processes

Applications of Silicon Dioxide Sputtering Targets

Optical Thin Film Preparation: SiO₂ targets can be used to prepare transparent films, anti-reflective films, and other optical functional thin films.
Electronic Device Deposition: Suitable for semiconductor device thin film and functional layer deposition, improving device reliability.
Protective Coatings: Used to prepare corrosion-resistant and protective thin films, improving material surface properties.
Research and Process Validation: Supports research on new thin film materials and optimization of deposition parameters.

FAQs

Q1: What thin films are Silicon Dioxide sputtering targets mainly used for?
A1: Primarily used for optical thin films, electronic device thin films, and protective coatings.

Q2: How does the SiO₂ target perform in high-temperature deposition?
A2: High thermal stability ensures uniform film deposition even at high temperatures.

Q3: Which sputtering processes is this target suitable for?
A3: Suitable for magnetron sputtering and other conventional thin film deposition processes.

Q4: Does the target structure affect film uniformity?
A4: A well-designed target structure can improve film thickness and composition uniformity.

Report

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request

Why Choose Us?

We have mature supply and technical experience in the field of ceramic sputtering targets, providing stable and traceable Silicon Dioxide sputtering targets to support customers in achieving consistency and reliability in thin film deposition during R&D and application stages.