Silicon Chromium sputtering targets are silicon-chromium alloy targets suitable for preparing functional thin films with good adhesion and thermal stability. They are commonly used in microelectronics, barrier layers, corrosion-resistant coatings, and related functional thin film applications.
We can provide process-compatible Silicon Chromium sputtering targets and support technical integration of composition design and deposition parameters.
Controllable film composition
Good thermal stability
Excellent adhesion
Suitable for various sputtering processes
Good process consistency
Microelectronics and Integrated Circuit Thin Films: Silicon Chromium films are commonly used in microelectronic devices as functional layers or auxiliary structural layers.
Barrier Layers and Interface Engineering: In multilayer structures, SiCr films can be used to improve interface stability and material compatibility.
Corrosion-Resistant and Functional Coatings: Suitable for functional coating systems requiring corrosion resistance and thermal stability.
Research and Process Development: Used for process verification and parameter optimization of novel thin film structures.
Q1: What thin film applications are suitable for Silicon Chromium sputtering targets?
A1: Primarily used in microelectronics, barrier layers, functional thin films, and corrosion-resistant coatings.
Q2: What are the main advantages of SiCr thin films?
A2: Advantages include good thermal stability, adhesion, and film structural stability.
Q3: What sputtering methods can this target be used for?
A3: Suitable for common thin film deposition processes such as magnetron sputtering.
Q4: Does alloy composition affect film performance?
A4: Proper composition design helps optimize the interfacial properties and overall performance of the film.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We have experience in designing and supplying alloy sputtering targets, and can provide stable and traceable Silicon Chromium sputtering targets to support customers in process verification and thin film performance optimization before R&D and mass production.
Molecular formula: SiCr
Appearance: Silver-gray dense target
Density: 6.2–6.5 g/cm³ (depending on Si:Cr ratio)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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