Silicon Carbide Rotary Target is a ceramic rotating target for continuous thin film deposition, suitable for processes requiring high stability and long-term operation. It is primarily used in large-area coatings, functional thin films, and industrial continuous sputtering systems.
We can provide process-compatible Silicon Carbide Rotary Targets and support technical integration of structural design and deposition conditions.
Suitable for continuous sputtering processes
Stable film composition
High target utilization
Suitable for large-area deposition
Good operational stability
Large-area functional coatings: The Silicon Carbide Rotary Target is suitable for the continuous preparation of functional coatings on glass, metal, or polymer substrates.
Industrial continuous sputtering systems: In roll-to-roll or in-line sputtering equipment, the rotating target structure helps improve production stability.
Abrasion-resistant and protective films: Used to prepare high-hardness, protective films that meet the requirements of long-term service environments.
Research and process validation: Supports the development of new process parameters and the evaluation of film performance.
Q1: What are the advantages of a Silicon Carbide Rotary Target compared to a planar target?
A1: Rotary targets achieve higher target utilization and improve the stability of the sputtering process.
Q2: Are SiC rotating targets suitable for long-term operation?
A2: Yes, the rotating structure helps dissipate heat and supports continuous operation.
Q3: In which systems are silicon carbide rotating targets commonly used?
A3: Primarily used in industrial continuous sputtering and large-area thin film deposition systems.
Q4: Does the rotating target structure affect film uniformity?
A4: A well-designed rotating target helps improve film thickness and compositional uniformity.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We have structural understanding and supply experience in the field of ceramic rotating targets, enabling us to provide stable and traceable Silicon Carbide Rotary Targets, supporting customers in achieving stable and highly consistent thin film deposition in continuous sputtering processes.
Molecular Formula: SiC
Molecular Weight: 52.11 g/mol
Appearance: Black, dense rotating target tube
Density: 3.21–3.22 g/cm³ (sintered target)
Melting Point: 2730 °C (decomposes)
Crystal Structure: Hexagonal (α-SiC); Cubic (β-SiC)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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