Potassium Tantalum Oxide sputtering targets are functional ceramic targets based on perovskite-structured oxides, characterized by uniform composition and structural stability. These targets are primarily used for preparing oxide thin films, applied in the fields of electronic materials and functional thin film research.
We offer KTaO3 sputtering targets in various sizes, thicknesses, and mounting methods, supporting custom processing. Please contact us for matching solutions.
High-density ceramic target
Stable and reliable sputtering process
Good thin film composition repeatability
Supports RF sputtering processes
Backplane bonding available
Suitable for research and pilot-scale production
Oxide Functional Thin Film Preparation: Commonly used to prepare perovskite-structured oxide thin films, helping to obtain functional layers with stable composition and controllable thickness.
Electronic and Dielectric Thin Film Research: In electronic materials research, this target can be used for the deposition of dielectric or functional thin films to evaluate device performance.
Multilayer Thin Film and Heterogeneous Structure Development: Suitable for the preparation of multilayer or heterojunction thin films, providing valuable reference for interface quality control.
Process Parameter and Deposition Condition Optimization: This target is commonly used in the sputtering process development stage to study the effects of power, atmosphere, and temperature on thin film performance.
Q1: Is the Potassium Tantalum Oxide sputtering target suitable for DC or RF sputtering?
A1: As a ceramic target, it is generally more suitable for RF sputtering processes.
Q2: Is the target prone to cracking during sputtering?
A2: Under appropriate process conditions, the target structure is stable and cracking is not a problem.
Q3: Can you provide targets bonded to a backplane?
A3: Yes, we support bonding services with copper or other commonly used backplanes.
Q4: Does the target require special treatment before use?
A4: Generally, no special treatment is required; standard sputtering target usage procedures are sufficient.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We have extensive experience in oxide ceramic sputtering targets, enabling us to provide reliable support in material consistency, processing accuracy, and application matching, helping our clients steadily advance thin film R&D and process validation.
Molecular Formula: KTaO₃
Molecular Weight: 268.05
Appearance: Grayish-white target material
Density: ≥ 6.75 g/cm³ (Theoretical density ≥ 95%)
Melting Point: Approximately 1320 °C
Crystal Structure: Cubic crystal system (perovskite structure, ceramic polycrystalline structure)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
