| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 410800ST001 | Nb2O5 | 99.99% | 124.6mm x 110mm x 8mm | Inquire |
| 410800ST002 | Nb2O5 | 99.99% | 316.3 mm x 127 mm x 10mm | Inquire |
| 410800ST003 | Nb2O5 | 99.99% | 299.6 mm x 129 mm x 8mm | Inquire |
| 410800ST004 | Nb2O5 | 99.99% | Ø 50.8 mm x 3.175 mm | Inquire |
| 410800ST005 | Nb2O5 | 99.99% | Ø 76.2 mm x 6.35 mm | Inquire |
| 410800ST006 | Nb2O5 | 99.99% | Ø 101.6 mm x 3.175 mm | Inquire |
| 410800ST007 | Nb2O5 | 99.99% | Ø 203.2 mm x 6.35 mm | Inquire |
Niobium pentoxide sputtering targets are high-purity, dense niobium oxide materials specifically designed for PVD (Physical Vapor Deposition) processes, ensuring uniform film deposition and high adhesion.Widely used for optical thin films, capacitor coatings, touch screens, and thin film deposition in high-performance electronic devices.
We offer a variety of Nb2O5 sputtering targets with high purity and uniform density. Sizes, thicknesses, and shapes can be customized to meet customer needs, suitable for research and industrial production. Please contact us.
High Purity Nb₂O₅ 99.99%
Dense and Uniform, High Mechanical Strength
Smooth Surface, Pore-Free
High Adhesion and Stable Thin Film Deposition
Customizable Sizes, Thicknesses, and Shapes
Customizable Target Bonding Services
Improved Target Utilization Efficiency
Suitable for Research and Industrial PVD Applications
Optical Thin Films: Used for coating optical lenses and displays, ensuring uniform film adhesion.
Capacitor Coating: Improves capacitance performance and stability in the preparation of niobium and tantalum capacitor films.
Touchscreen Materials:Used for conductive thin film deposition, enhancing touchscreen sensitivity and response speed.
High-Performance Electronic Devices:Applied in the preparation of thin films for microelectronic devices, ensuring conductivity and durability.
1. What is niobium pentoxide sputtering target used for?
Niobium pentoxide sputtering targets (Nb₂O₅ targets) are used for depositing niobium oxide thin films through sputtering processes. They are commonly applied in optical coatings, electronic materials, dielectric layers, and advanced thin-film research where controlled oxide deposition is required.
2. Why is niobium pentoxide selected as a sputtering material?
Niobium pentoxide is selected as a sputtering material because Nb₂O₅ thin films can provide useful optical, dielectric, and chemical stability properties. These characteristics make it suitable for applications requiring functional oxide coatings and high-performance thin films.
3. What factors should be considered when choosing a niobium pentoxide sputtering target?
Important factors when selecting a niobium pentoxide sputtering target include purity, density, composition uniformity, target dimensions, bonding method, sputtering equipment compatibility, and the required thin-film properties.
4. How does niobium pentoxide sputtering target quality affect thin film performance?
The quality of a niobium pentoxide sputtering target can influence deposition stability, film uniformity, defect levels, and overall coating performance. High-purity materials with consistent composition help support reliable thin-film production.
5. What applications use niobium pentoxide thin films deposited from sputtering targets?
Niobium pentoxide thin films deposited from sputtering targets are used in optical coatings, dielectric materials, electronic devices, sensor-related research, and other advanced thin-film applications. The final application depends on the required film properties and deposition process.
6. Can niobium pentoxide sputtering targets be customized?
Yes. Niobium pentoxide sputtering targets can be customized according to application requirements, including target size, shape, purity, thickness, and bonding options. ULPMAT supports customized specifications for different sputtering systems and research needs.
7. What purity levels are available for niobium pentoxide sputtering targets?
Niobium pentoxide sputtering targets are commonly available in high-purity grades for thin-film deposition applications. ULPMAT provides Nb₂O₅ targets with different specifications based on customer requirements, including purity and target configuration.
8. How does ULPMAT supply niobium pentoxide sputtering targets?
ULPMAT supplies high-purity niobium pentoxide sputtering targets for optical coating, electronic material, and thin-film research applications. We provide material selection support, customized target specifications, and solutions based on customer deposition requirements.
Each batch is provided with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request.
High-purity Nb₂O₅ sputtering targets, reliable and stable performance
Customizable sizes, thicknesses, and shapes to meet different PVD processes
Provide complete test reports and compliance certificates
Quick response to customer needs, supporting small-batch research and large-batch industrial supply
Professional technical team provides thin film deposition and application guidance
Years of export experience, safe and reliable transportation
Chemical Formula: Nb₂O₅
Molecular Weight: 265.81 g/mol
Appearance: White to off-white dense target material
Density: ≈ 4.6–4.7 g/cm³
Melting Point: 1512 ℃
Crystal Structure: Orthorhombic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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