| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 410800ST001 | Nb2O5 | 99.99% | 124.6mm x 110mm x 8mm | Inquire |
| 410800ST002 | Nb2O5 | 99.99% | 316.3 mm x 127 mm x 10mm | Inquire |
| 410800ST003 | Nb2O5 | 99.99% | 299.6 mm x 129 mm x 8mm | Inquire |
| 410800ST004 | Nb2O5 | 99.99% | Ø 50.8 mm x 3.175 mm | Inquire |
| 410800ST005 | Nb2O5 | 99.99% | Ø 76.2 mm x 6.35 mm | Inquire |
| 410800ST006 | Nb2O5 | 99.99% | Ø 101.6 mm x 3.175 mm | Inquire |
| 410800ST007 | Nb2O5 | 99.99% | Ø 203.2 mm x 6.35 mm | Inquire |
Niobium pentoxide sputtering targets are high-purity, dense niobium oxide materials specifically designed for PVD (Physical Vapor Deposition) processes, ensuring uniform film deposition and high adhesion.Widely used for optical thin films, capacitor coatings, touch screens, and thin film deposition in high-performance electronic devices.
We offer a variety of Nb2O5 sputtering targets with high purity and uniform density. Sizes, thicknesses, and shapes can be customized to meet customer needs, suitable for research and industrial production. Please contact us.
High Purity Nb₂O₅ 99.99%
Dense and Uniform, High Mechanical Strength
Smooth Surface, Pore-Free
High Adhesion and Stable Thin Film Deposition
Customizable Sizes, Thicknesses, and Shapes
Customizable Target Bonding Services
Improved Target Utilization Efficiency
Suitable for Research and Industrial PVD Applications
Optical Thin Films: Used for coating optical lenses and displays, ensuring uniform film adhesion.
Capacitor Coating: Improves capacitance performance and stability in the preparation of niobium and tantalum capacitor films.
Touchscreen Materials:Used for conductive thin film deposition, enhancing touchscreen sensitivity and response speed.
High-Performance Electronic Devices:Applied in the preparation of thin films for microelectronic devices, ensuring conductivity and durability.
Q1: What are the packaging options for Nb2O5 sputtering targets?
A1: We offer moisture-proof sealed packaging, vacuum bag packaging, and rigid box packaging to ensure the targets are not contaminated or oxidized during transportation and storage.
Q2: What processing can Nb2O5 sputtering targets undergo?
A2: Cutting, drilling, surface polishing, and machining are possible to adapt to different PVD processes and experimental requirements.
Q3: What are the storage requirements for Nb₂O₅ sputtering targets?
A3: Store in a dry, cool, and well-ventilated environment, avoiding moisture, high temperatures, or chemical contamination. For long-term storage, inert gas or sealed packaging is recommended.
Q4: What are the purity and advantages of Nb₂O₅ sputtering targets?
A4: Our sputtering targets have a purity of 99.99%, uniform density, and strong thermal stability, ensuring uniform film deposition and high adhesion, making them suitable for research and industrial applications.
Each batch is provided with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request.
High-purity Nb₂O₅ sputtering targets, reliable and stable performance
Customizable sizes, thicknesses, and shapes to meet different PVD processes
Provide complete test reports and compliance certificates
Quick response to customer needs, supporting small-batch research and large-batch industrial supply
Professional technical team provides thin film deposition and application guidance
Years of export experience, safe and reliable transportation
Chemical Formula: Nb₂O₅
Molecular Weight: 265.81 g/mol
Appearance: White to off-white dense target material
Density: ≈ 4.6–4.7 g/cm³
Melting Point: 1512 ℃
Crystal Structure: Orthorhombic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
