Niobium Pentoxide-Chromium Oxide sputtering targets are high-purity composite oxide targets that combine the high dielectric properties of niobium pentoxide with the chemical stability of chromium oxide, specifically designed for physical vapor deposition (PVD) processes. They are widely used in electronic ceramic thin films, optical coatings, transparent conductive coatings, and thin film deposition for high-temperature electronic devices.
We offer a variety of Nb₂O₅-Cr₂O₃ sputtering targets with high purity and uniform structure. Sizes, thicknesses, and target shapes can be customized to meet customer requirements for both research and industrial production. For detailed specifications, pricing, or customization services for Nb₂O₅-Cr₂O₃ sputtering targets, please contact our sales team. We provide professional technical support and a rapid response.
High-purity composite oxide (99.95%)
Uniform and dense, smooth surface
Good chemical and thermal stability
Excellent thin film adhesion
Customizable size, thickness, and target shape
Improved target utilization, reduced process costs
Target bonding services available
Suitable for research and industrial PVD applications
Electronic ceramic thin films: Used to prepare high dielectric constant thin films, improving the performance of electronic components.
Optical coatings: Used for coating optical lenses and displays, improving film wear resistance and light transmittance.
Transparent conductive coatings: Used for conductive thin film deposition in touch screens and transparent electronic devices.
High-temperature electronic devices: Used for the preparation of thin films for electronic devices in high-temperature environments, ensuring stability and durability.
Q1: What are the packaging methods for Nb2O5-Cr2O3 sputtering targets?
A1: We offer moisture-proof sealed packaging, vacuum bag packaging, and rigid box packaging, which can be customized according to customer requirements to ensure that the target material is not contaminated or oxidized during transportation and storage.
Q2: What processing can Nb₂O₅-Cr₂O₃ sputtering targets undergo?
A2: They can be cut, drilled, surface polished, and machined to meet the needs of different PVD processes and scientific research experiments.
Q3: What are the storage requirements for Nb₂O₅-Cr₂O₃ sputtering targets?
A3: Please store in a dry, cool, and ventilated environment, avoiding moisture, high temperatures, and chemical contamination. For long-term storage, it is recommended to use inert gas or sealed packaging.
Q4: What are the purity and advantages of Nb₂O₅-Cr₂O₃ sputtering targets?
A4: Our sputtering targets boast a purity of ≥99.9%, uniform density, strong thermal stability, and a combination of high dielectric and chemical stability, making them suitable for research and high-precision industrial PVD applications.
Each batch is provided with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request.
High-purity Nb₂O₅-Cr₂O₃ sputtering targets, stable and reliable performance
Customizable size, thickness, target shape, and surface treatment
Provides complete test reports and compliance certificates
Rapid response to customer needs, supporting small-batch research and large-batch industrial supply
Professional technical team provides thin film deposition and process guidance
Years of export experience, safe and reliable transportation
Chemical formula: Nb₂O₅-Cr₂O₃
Appearance: Metallic gray tubular target with a glossy surface
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
