Niobium Molybdenum Tantalum Alloy sputtering targets are composed of three high-melting-point metals, possessing excellent corrosion resistance, stable mechanical strength, and good thin film formation properties. They are one of the commonly used composite targets in high-performance thin film engineering. They are mainly used for sputtering preparation of high-heat-resistant thin films, electrically functional films, and advanced coating technologies.
We offer various NbMoTa alloy ratios (3-element ratios can be customized upon request), high-density sintered targets, and HIP densified products suitable for DC, RF, and magnetron sputtering equipment. Targets can be processed into circular, rectangular, rotating, and stepped targets, and backplane bonding services are supported. Contact us for technical information.
High-melting-point ternary alloy system
Excellent heat resistance and corrosion resistance
Adjustable alloy ratio
High density, low impurity content
Excellent film uniformity
Supports customized complex structures
Applicable to various sputtering processes
Functional Thin Film Deposition: Used to prepare highly stable conductive films or barrier layers.
High-Temperature Coatings: Suitable for protective coatings in extreme temperature environments.
Optical Engineering Thin Films: Used for optical thin film deposition requiring high strength and stability.
Scientific Research and Advanced Manufacturing: Widely used in materials research and the development of new thin film processes.
Q1: Is the packaging of NbMoTa targets safe?
A1: All targets are packaged using a three-level packaging system: anti-static bags, shock-absorbing foam, and sealed outer boxes to ensure no damage during transportation and prevent moisture intrusion.
Q2: What processing methods does this target support? A2: We offer precision machining, HIP densification, powder metallurgy sintering, CNC engraving, and backplane bonding processes.
Q3: How should sputtering targets be stored?
A3: We recommend storing them in a dry, sealed environment, avoiding exposure to acidic gases and humidity to maintain target surface cleanliness and structural stability.
Q4: What is the purity range of ternary alloy targets?
A4: We can provide 99.9% purity targets upon request. All raw materials undergo rigorous testing to ensure a stable and reliable film formation process.
Each batch is provided with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request.
With years of experience in rare metal and alloy sputtering, we offer:
A comprehensive quality control system to ensure product stability;
Customizable ternary and quaternary complex alloy sputtering materials;
Fast delivery cycles and flexible customization support;
An independent technical team providing process optimization advice;
Professional export capabilities serving global clients;
High repurchase rate and extensive experience in long-term industry cooperation.
Chemical Formula: NbMoTa
Appearance: Silver-gray dense target material
Crystal Structure: Body-centered cubic structure
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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