ULPMAT

Niobium metal

Chemical Name:
Niobium metal
Formula:
Nb
Product No.:
4100
CAS No.:
7440-03-1
EINECS No.:
231-113-5
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
4100ST001 Nb 99.9% Ø 50.8 mm x 3.175 mm Inquire
4100ST002 Nb 99.9% Ø 76.2 mm x 3.175 mm Inquire
4100ST003 Nb 99.9% Ø 76.2 mm x 6.35 mm Inquire
4100ST004 Nb 99.95% Ø 50.8 mm x 3.175 mm Inquire
4100ST005 Nb 99.95% Ø 50.8 mm x 6.35 mm Inquire
4100ST006 Nb 99.95% Ø 76.2 mm x 3.175 mm Inquire
4100ST007 Nb 99.95% Ø 76.2 mm x 6.35 mm Inquire
4100ST008 Nb 99.95% Ø 101.6 mm x 3.175 mm Inquire
4100ST009 Nb 99.95% Ø 203.2 mm x 6.35 mm Inquire
4100ST010 Nb 99.99% Ø 50.8 mm x 3.175 mm Inquire
4100ST011 Nb 99.99% Ø 50.8 mm x 6.35 mm Inquire
4100ST012 Nb 99.99% Ø 76.2 mm x 3.175 mm Inquire
4100ST013 Nb 99.99% Ø 76.2 mm x 6.35 mm Inquire
4100ST014 Nb 99.99% Ø 101.6 mm x 3.175 mm Inquire
4100ST015 Nb 99.99% Ø 203.2 mm x 6.35 mm Inquire
Product ID
4100ST001
Formula
Nb
Purity
99.9%
Dimension
Ø 50.8 mm x 3.175 mm
Product ID
4100ST002
Formula
Nb
Purity
99.9%
Dimension
Ø 76.2 mm x 3.175 mm
Product ID
4100ST003
Formula
Nb
Purity
99.9%
Dimension
Ø 76.2 mm x 6.35 mm
Product ID
4100ST004
Formula
Nb
Purity
99.95%
Dimension
Ø 50.8 mm x 3.175 mm
Product ID
4100ST005
Formula
Nb
Purity
99.95%
Dimension
Ø 50.8 mm x 6.35 mm
Product ID
4100ST006
Formula
Nb
Purity
99.95%
Dimension
Ø 76.2 mm x 3.175 mm
Product ID
4100ST007
Formula
Nb
Purity
99.95%
Dimension
Ø 76.2 mm x 6.35 mm
Product ID
4100ST008
Formula
Nb
Purity
99.95%
Dimension
Ø 101.6 mm x 3.175 mm
Product ID
4100ST009
Formula
Nb
Purity
99.95%
Dimension
Ø 203.2 mm x 6.35 mm
Product ID
4100ST010
Formula
Nb
Purity
99.99%
Dimension
Ø 50.8 mm x 3.175 mm
Product ID
4100ST011
Formula
Nb
Purity
99.99%
Dimension
Ø 50.8 mm x 6.35 mm
Product ID
4100ST012
Formula
Nb
Purity
99.99%
Dimension
Ø 76.2 mm x 3.175 mm
Product ID
4100ST013
Formula
Nb
Purity
99.99%
Dimension
Ø 76.2 mm x 6.35 mm
Product ID
4100ST014
Formula
Nb
Purity
99.99%
Dimension
Ø 101.6 mm x 3.175 mm
Product ID
4100ST015
Formula
Nb
Purity
99.99%
Dimension
Ø 203.2 mm x 6.35 mm

Niobium Metal Sputtering Target Overview

Niobium metal sputtering targets are high-purity, dense metallic materials specifically designed for physical vapor deposition (PVD) processes, ensuring uniform film deposition and high adhesion. They are widely used in thin film deposition for semiconductor devices, optical coatings, touch screens, and electronic components.

We offer various specifications of niobium metal sputtering targets, featuring high purity and uniform density. Diameter, thickness, and shape can be customized to meet customer needs, suitable for both scientific research and industrial production. For pricing or customization options, please contact us.

Product Highlights

High-purity niobium (99.99%)
Dense and uniform, high mechanical strength
High electrical conductivity and thermal stability
Smooth surface, free of pores
Customizable size, thickness, and shape
Target bonding services available
Suitable for various PVD sputtering processes
Provides solutions for both scientific research and industrial applications

Applications of Niobium Metal Sputtering Target

Semiconductor Devices: Used to prepare high-performance semiconductor thin films, improving device reliability.
Optical Coating: Used for thin-film deposition in optical lenses and displays, ensuring uniformity and adhesion of the film layer.
Touchscreen Materials: Used in the manufacture of conductive thin films for touchscreens, improving response speed and sensitivity.
Electronic Components: Used for thin-film deposition in electronic devices, ensuring high conductivity and durability.

FAQs

Q1: What are the packaging methods for niobium sputtering targets?
A1: We provide moisture-proof sealed packaging, vacuum bag packaging, and rigid cardboard box packaging to ensure that the target material is not contaminated or oxidized during transportation and storage.

Q2: What processing can niobium sputtering targets undergo?
A2: They can be cut, drilled, surface polished, and machined to meet different PVD processes and research needs.

Q3: What are the storage requirements for niobium sputtering targets?
A3: Please store in a dry, cool, and ventilated environment, avoiding moisture and high temperatures. For long-term storage, it is recommended to use inert gas or sealed packaging.

Q4: What are the advantages and purity of niobium targets?
A4: Our niobium targets boast a purity of up to 99.99%, uniform density, and strong thermal stability, ensuring uniform film deposition and high adhesion, making them suitable for high-precision scientific research and industrial applications.

Reports

Each batch is provided with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request.

Why Choose Us?

High-purity niobium targets, stable and reliable performance
Customization of size, shape, and thickness available
Complete testing reports and compliance certificates provided
Rapid response to customer needs, supporting small and large batch orders
Professional technical team provides PVD application advice
Years of export experience, safe and reliable transportation

Chemical Formula: Nb
Atomic Weight: 92.906 g/mol
Appearance: Silver-gray metallic target, commonly round or square; metallic luster
Density: 8.57 g/cm³ (theoretical density)
Melting Point: 2477 ℃
Boiling Point: 4744 ℃
Crystal Structure: Body-centered cubic structure

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

Documents

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