Niobium metal Rotary Target are high-purity, high-density metallic materials specifically designed for rotary target PVD (Physical Vapor Deposition) processes, ensuring uniform film deposition and high target utilization. They are widely used in thin film deposition for semiconductor devices, optical coatings, touch screens, and high-precision electronic components.
We offer various specifications of Niobium metal Rotary Target, featuring high purity and uniform density. Diameter, thickness, and target shape can be customized to meet customer needs, suitable for both scientific research and industrial production. For detailed specifications of niobium rotary sputters, please contact us.
High-purity niobium ≥99.95%
High density and strong mechanical strength
High electrical conductivity and thermal stability
Smooth surface, free of pores
Customizable size, thickness, and shape
Improved target utilization and reduced process costs
Target bonding services available
Suitable for scientific research and industrial applications
Semiconductor Devices: Used for high-performance semiconductor thin film deposition, improving device reliability.
Optical Coatings: Used in the preparation of thin films for optical lenses and displays, ensuring uniform film adhesion.
Touchscreen Materials: Used to manufacture conductive thin films for touchscreens, improving response speed and sensitivity.
High-Precision Electronic Components: Used for thin-film deposition in electronic devices, ensuring high conductivity and stability.
1. What is a niobium metal rotary target used for?
Niobium metal rotary target is mainly used as a sputtering material for physical vapor deposition (PVD) processes. It is commonly applied in the production of thin films for optical coatings, semiconductor-related applications, display technologies, and advanced research. Compared with planar targets, rotary targets can provide higher material utilization and longer sputtering operation time in suitable coating systems.
2. What are the advantages of using a niobium rotary target compared with a planar niobium target?
The main advantages of a niobium rotary target include higher target utilization, more stable sputtering performance, and reduced target replacement frequency. Rotary designs allow erosion to occur around the entire target surface, which helps achieve more efficient material usage in large-area coating systems.
3. What purity levels are available for niobium metal rotary targets?
Niobium metal rotary targets are commonly supplied in high-purity grades, such as 99.9% and 99.95% niobium. Higher purity grades can help reduce contamination risks during sputtering and improve thin-film consistency for demanding coating applications.
4. How do I choose the right niobium rotary target for my sputtering system?
The selection of a niobium rotary target depends on several factors, including target diameter, length, wall thickness, purity, bonding requirements, sputtering equipment compatibility, and required film properties. The correct specification should match the magnetron sputtering system and production conditions.
5. Can niobium metal rotary targets be customized?
Yes. Niobium rotary targets can be customized according to customer requirements, including dimensions, purity, target geometry, and bonding solutions. Custom manufacturing helps ensure compatibility with different sputtering equipment and coating processes.
6. What factors affect the sputtering performance of a niobium rotary target?
The sputtering performance of a niobium rotary target is affected by material purity, density, microstructure, dimensional accuracy, surface quality, and bonding quality. A uniform target structure helps maintain stable deposition rates and consistent film quality during sputtering.
7. What applications use niobium rotary sputtering targets?
Niobium rotary sputtering targets are used for depositing niobium-based thin films in applications such as optical coatings, conductive layers, protective coatings, superconducting research, and advanced material development. The specific application depends on the required film characteristics and deposition process.
8. How does ULPMAT supply niobium metal rotary targets?
ULPMAT supplies high-purity niobium metal rotary targets for research, development, and industrial sputtering applications. We provide different purity options, customized dimensions, and technical support for target selection based on customer equipment and deposition requirements.
Each batch is provided with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request.
High-purity niobium rotating targets, stable and reliable performance
Customization of size, shape, and thickness available
Complete testing reports and compliance certificates provided
Rapid response to customer needs, supporting small and large batch orders
Professional technical team providing PVD application and process guidance
Years of export experience, safe and reliable transportation
Chemical Formula: Nb
Atomic Weight: 92.906 g/mol
Appearance: Silver-gray metallic cylindrical or tubular target material with a metallic luster
Density: 8.57 g/cm³ (theoretical density at 20 ℃)
Melting Point: 2477 ℃
Boiling Point: 4744 ℃
Crystal Structure: Body-centered cubic structure
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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