Niobium Chromium Alloy sputtering targets are sputtering materials that combine excellent mechanical stability, electrical properties, and high-temperature corrosion resistance. They are commonly used to prepare high-adhesion, wear-resistant, and functional thin film coatings. They are primarily used for high-end functional thin film deposition, surface engineering, and film fabrication for electronic devices.
We can produce various NbCr alloy ratios to support various structures. Our products undergo densification treatment and fine grain control, making them suitable for magnetron sputtering, RF sputtering, and industrial-scale continuous coating production.For the latest NbCr target prices, please contact us.
High-density alloy target
Customizable ratios
Stable sputtering rate
Excellent high-temperature resistance
High-uniformity thin film deposition
Low oxidation and low impurity content
Suitable for long-term continuous coating
Hard Coating Preparation: Used for wear-resistant coating deposition on tools, molds, and mechanical parts.
Electronic Thin Film Applications: Used for the fabrication of functional films such as microelectronic devices and barrier layers.
Optical Thin Film Engineering: Suitable for the deposition of high-stability optical thin films and protective layers.
Industrial Coating Production: Used in continuous sputtering processes in large-area coating equipment.
Q1: How is the NbCr target packaged?
A1: The target will be vacuum-sealed with shock-absorbing foam and placed in a hard wooden or metal box to ensure no scratches or moisture intrusion during transportation.
Q2: What processing methods does this target support?
A2: We can provide various processing methods including hot isostatic pressing (HIP), casting, powder metallurgy, machining, and backplane bonding to meet the interface requirements of different equipment.
Q3: Are the storage requirements for Niobium Chromium targets high?
A3: It is recommended to store in a dry, clean environment, avoiding high humidity and corrosive gases, to maintain the surface condition and long-term stability of the target.
Q4: What level of purity do you provide for your targets? A4: We can achieve 99.9% purity according to customer requirements, with strict impurity control, suitable for sensitive applications such as high-end optoelectronics and semiconductors.
Each batch is provided with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request.
Years of experience specializing in metal sputtering target manufacturing
Precise control of alloy composition ratios and microstructure
Strict quality control system ensures film stability
Fast delivery capability suitable for research and mass production
OEM/ODM customization support
Reliable international logistics experience suitable for global customers
Providing professional technical support from consultation to after-sales service
Chemical Formula: NbCr
Appearance: Silver-gray dense target material
Crystal Structure: Body-centered cubic structure
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
