Niobium Boride sputtering targets are ceramic conductive targets made of high-purity niobium diboride. They possess high hardness, high melting point, wear resistance, and excellent chemical stability, making them suitable for various thin film deposition technologies and maintaining stable performance in high-temperature and harsh environments. They are primarily used for depositing high-hardness thin films, corrosion-resistant coatings, functional ceramic thin films, and protective layers for electronic devices.
We offer NbB2 sputtering targets in various purities, sizes, densities, and grain structures, supporting round targets, square targets, and custom composite target structures. The target surfaces are highly smooth and suitable for magnetron sputtering, DC/RF sputtering equipment, and more. Please contact our sales team for professional technical support and the fastest response service.
High density, low porosity
High purity NbB2, strong stability
High hardness and wear resistance
Good sputtering rate
Customizable size and structure available
Fine surface finishing for uniform film deposition
Supports target bonding
Stable chemical properties, corrosion resistant
Wear-resistant thin film materials: Used for depositing high-hardness thin films to improve the wear resistance of mechanical parts.
Corrosion-resistant protective layers: Used to prepare corrosion-resistant thin films on the surface of chemical equipment, improving long-term stability.
Functional ceramic thin films: Used for the preparation of high-temperature ceramic thin films, improving the mechanical strength and thermal stability of materials.
Electronic component thin films: Used for the preparation of protective or conductive films for high-temperature, wear-resistant electronic devices.
Q1: What is the standard packaging method for NbB₂ sputtering targets?
A1: Targets are typically packaged with shock-absorbing foam and vacuum-sealed aluminum foil, then placed in a rigid outer box to ensure protection from oxidation and damage during transportation. Packaging levels can be upgraded according to customer requirements.
Q2: What processing methods are NbB2 sputtering targets suitable for?
A2: They can be used in thin film deposition processes such as magnetron sputtering, RF sputtering, and DC sputtering. The high flatness of the target surface ensures stable film deposition efficiency.
Q3: How should this target be stored to maintain optimal performance?
A3: Please store the target in a dry, sealed environment, avoiding moisture and corrosive gases. It is recommended to keep it in its original packaging when not in use.
Q4: Does the purity of the NbB2 target affect film quality?
A4: Yes, the higher the purity of the target, the lower the impurity content in the film. We provide high-purity NbB₂ targets to ensure higher film consistency and stronger performance stability.
Each batch is provided with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request.
Provide high-density, low-oxygen-content, high-quality NbB₂ sputtering targets
Support standard specifications and custom sizes
A comprehensive quality testing system ensures stable and reliable production for every batch
An experienced technical team to assist in optimizing thin film deposition parameters
Fast delivery cycles to meet research and mass production needs
Global supply capabilities, supporting multi-country shipping and export documentation
Chemical Formula: NbB₂
Molecular Weight: 114.53 g/mol
Appearance: Black, dense target material
Density: ≈ 6.97 g/cm³
Melting Point: Approximately 3050 ℃
Crystal Structure: Hexagonal (AlB₂ type structure)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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