ULPMAT

Nickel Zirconium Alloy

Chemical Name:
Nickel Zirconium Alloy
Formula:
NiZr
Product No.:
284000
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
284000ST001 NiZr 99.9% Ø 76.2 mm x 6.35 mm Inquire
284000ST002 NiZr 99.9% Ø 101.6 mm x 6.35 mm Inquire
Product ID
284000ST001
Formula
NiZr
Purity
99.9%
Dimension
Ø 76.2 mm x 6.35 mm
Product ID
284000ST002
Formula
NiZr
Purity
99.9%
Dimension
Ø 101.6 mm x 6.35 mm

Nickel Zirconium Alloy Sputtering Target Overview

Nickel Zirconium Alloy sputtering targets are nickel-zirconium alloy targets used to prepare functional thin films with good stability and dense structure.

We can provide nickel-zirconium alloy sputtering targets with controllable composition and high density, supporting customization of size and composition. Please contact us for technical support.

Product Highlights

High purity
Uniform and stable composition
High target density
Stable discharge process
Good film adhesion
Suitable for long-term sputtering
Supports bonding and backplane customization

Applications of Nickel Zirconium Alloy Sputtering Targets

Functional Thin Film Deposition: This sputtering target is suitable for the preparation of various functional thin films, helping to obtain nickel-zirconium alloy thin films with uniform structure and stable performance.
Microelectronics and Device Research: In microelectronics and related device research, nickel-zirconium alloy thin films can be used to explore interface properties and structural stability.
Corrosion Resistance and Structural Coatings: Nickel-zirconium alloy coatings prepared by sputtering processes have application value in corrosion resistance and structural protection research.
Scientific Research and Process Validation: This target is suitable for universities and research institutions to conduct thin film process parameter optimization and material performance verification experiments.

FAQs

Q1: Which sputtering processes are suitable for nickel-zirconium sputtering targets?
A1: Suitable for DC or RF sputtering processes, and can be matched according to equipment conditions.

Q2: How stable is the target during use?
A2: The target has high density, stable discharge during sputtering, and is suitable for continuous use.

Q3: Can the size and alloy ratio be customized?
A3: The target size and composition range can be customized according to equipment and process requirements.

Q4: What precautions should be taken when storing the target?
A4: It is recommended to store it in a dry, clean environment in a sealed container to avoid surface contamination.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request

Why Choose Us?

We have long focused on the preparation and supply of alloy sputtering targets, emphasizing composition control, target density, and process adaptability, providing stable and reliable material support for nickel-zirconium alloy thin film applications.

Molecular formula: NiZr
Appearance: Silver-gray metallic luster target material
Crystal structure: Cubic crystal structure

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

Documents

No PDF files found.

Contact Us

If you need any service, please contact us

More Information

more products

CONTACT US

Thermal Spray

Our website has been completely upgraded