Nickel silicide powder is a high-purity nickel disilicide material widely used in semiconductor devices, conductive thin films, optoelectronic materials, and scientific research and development.
We offer chemically stable, uniformly sized NiSi2 powder, customizable to meet specific process and application requirements. Contact us for detailed technical information.
High-purity nickel disilicide
Uniform powder
Excellent electrical conductivity
Good thermal stability
Easy to disperse and process
Reliable batch consistency
Customizable specifications and packaging
Semiconductor Devices: Suitable for semiconductor thin film and device fabrication, improving conductivity and device stability.
Conductive Thin Films: Used to prepare conductive films and functional coatings, enhancing the performance and durability of electronic devices.
Optoelectronic Materials: Suitable for optoelectronic device thin films, such as photovoltaics and photodetectors, enhancing photoelectric conversion efficiency.
Scientific Research and Process Development: Suitable for research institutions to conduct nickel disilicide powder performance testing, material modification, and new process experiments.
Q1: Can the particle size of NiSi2 powder be customized?
A1: Yes, we offer powders in various particle size ranges to meet different process and application requirements.
Q2: Is the powder prone to oxidation or decomposition?
A2: It is chemically stable under dry conditions at room temperature. Sealed storage is recommended to prevent moisture absorption.
Q3: Is NiSi2 powder suitable for semiconductor thin film preparation?
A3: Yes, its high purity and uniformity are beneficial for thin film deposition and device performance optimization.
Q4: Can the powder be used in conductive materials and scientific research experiments?
A4: Yes, it can improve conductivity and facilitate material testing and process development in research institutions.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We specialize in the research and supply of high-purity NiSi₂ powder, emphasizing powder uniformity, chemical stability, and process compatibility, providing reliable material support for semiconductor devices, conductive thin films, optoelectronic materials, and scientific research applications.
Molecular Formula: NiSi₂
Molecular Weight: 140.75 g/mol
Appearance: Black or grayish-black powder
Density: Approx. 6.51 g/cm³
Melting Point: Approx. 1,500°C
Boiling Point: Decomposition point approx. 2,000°C
Crystal Structure: Orthorhombic crystal structure
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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