| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 280800ST001 | NiO | 99.9% | Ø 50.8 mm x 3.175 mm | Inquire |
| 280800ST002 | NiO | 99.95% | Ø 76.2 mm x 3.175 mm | Inquire |
| 280800ST003 | NiO | 99.9% | Ø 76.2 mm x 3.175 mm | Inquire |
| 280800ST004 | NiO | 99.95% | Ø 76.2 mm x 3.175 mm | Inquire |
| 280800ST005 | NiO | 99.9% | Ø 75 mm x 4 mm | Inquire |
| 280800ST006 | NiO | 99.95% | Ø 76.2 mm x 5 mm | Inquire |
| 280800ST007 | NiO | 99.95% | Ø 203.2 mm x 6.35 mm | Inquire |
| 280800ST008 | NiO | 99.9% | 127 mm x 101 mm x 7mm | Inquire |
| 280800ST009 | NiO | 99.9% | 200 mm x 75 mm x 3.2mm | Inquire |
Nickel Oxide sputtering targets are high-purity nickel oxide targets suitable for the precision deposition of functional thin films and electronic ceramic thin films.
We offer chemically stable and high-density NiO sputtering targets. Custom sizes and specifications can be provided according to equipment and process requirements. Please contact us for technical information.
High-purity nickel oxide
Excellent target density
Uniform and stable composition
Uniform film deposition
Suitable for magnetron sputtering
Supports multi-specification customization
Supports bonding and backplane customization
Electronic ceramic thin films: Can be used for the deposition of electronic ceramic materials to control electrical, magnetic, or optical properties.
Functional thin film preparation: Suitable for preparing functional thin film layers, such as conductive films, optoelectronic films, or protective films.
Catalytic thin films: Can be used for the deposition of catalytic devices or thin film catalytic layers to improve catalytic reaction efficiency and selectivity.
Research and process development: Suitable for research institutions to conduct thin film structure control, target parameter optimization, and new process experiments.
Q1: Which type of sputtering equipment is NiO sputtering target suitable for?
A1: It can be used in magnetron sputtering equipment, but specific requirements need to be confirmed with the equipment specifications.
Q2: Is the target composition uniform and stable?
A2: Yes, the target composition remains consistent throughout the entire target block, ensuring film uniformity.
Q3: Do you support customized sizes or research specifications?
A3: Yes, we can provide various sizes and specifications according to experimental or production needs.
Q4: Is the composition of the sputtered film controllable?
A4: Under reasonable process parameters, the film composition maintains good consistency with the target.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We specialize in the R&D and production of high-purity NiO sputtering targets, emphasizing target density, compositional uniformity, and process adaptability, providing reliable material support for functional thin films, electronic ceramics, and scientific research applications.
Molecular Formula: NiO
Molecular Weight: 74.69 g/mol
Appearance: Black or green metallic target with a smooth surface
Density: Approx. 6.67 g/cm³
Melting Point: Approx. 1,915°C
Boiling Point: Approx. 2,700°C
Crystal Structure: Rock salt structure
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
