Nickel Niobium Titanium Alloy sputtering targets are high-purity nickel-niobium-titanium ternary alloy targets suitable for the deposition of functional thin films and high-precision microelectronic devices.
We offer NiNbTi sputtering targets with uniform composition and dense structure. Custom sizes and proportions can be provided to meet specific process requirements. Please contact us for technical information.
High-purity ternary alloy
Uniform and stable composition
Good film repeatability
High target density
Suitable for magnetron sputtering processes
Supports bonding and backplane customization
Supports multi-specification customization
High-performance functional thin films: Suitable for preparing nickel-niobium-titanium functional thin films with excellent mechanical, electrical, and magnetic properties, ensuring uniform and stable film layers.
Microelectronic device manufacturing: Used to form stable alloy thin film layers in microelectronic and MEMS devices, meeting precision process requirements.
Corrosion-resistant and protective films: Can be used to prepare corrosion-resistant, protective, or functional thin films, improving device stability in complex environments.
Research and Process Development: Suitable for experimental use in research institutions for thin film structure control, ternary alloy ratio optimization, and process parameter research.
Q1: Which sputtering equipment can NiNbTi sputtering targets be used with?
A1: Suitable for conventional magnetron sputtering equipment; specific requirements depend on equipment specifications.
Q2: Can the ternary ratio of the target be customized?
A2: Yes, customized solutions with different nickel, niobium, and titanium ratios can be provided according to the thin film performance requirements.
Q3: Is the thin film composition stable during sputtering?
A3: Under standard process conditions, the thin film composition maintains good consistency with the target.
Q4: Do you provide small-size or research-specification targets?
A4: Yes, we support this and can provide various specifications suitable for R&D and experimental stages.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We have extensive experience in the preparation and processing of nickel-niobium-titanium ternary alloy targets, emphasizing compositional uniformity, structural compactness, and process adaptability, providing reliable material support for functional thin films and high-performance microelectronic devices.
Molecular Formula: NiNbTi
Appearance: Silvery-white metallic target material with a smooth surface
Crystal Structure: Body-centered cubic crystal structure
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
