Nickel Niobium Alloy sputtering targets are high-purity nickel-niobium alloy targets suitable for high-precision deposition of functional thin films and microelectronic devices.
We offer NiNb sputtering targets with uniform composition and high density, customizable to meet equipment and process requirements. Please contact us for detailed information.
High-purity
Uniform and stable composition
Good film repeatability
High target density
Suitable for magnetron sputtering
Customizable bonding and backplanes
Custom processing supported
Functional Thin Film Preparation: Suitable for preparing nickel-niobium functional thin films with excellent mechanical and electrical properties, ensuring film consistency.
Microelectronic Devices: Used to form stable alloy thin film layers in microelectronic devices, meeting precision process requirements.
Corrosion-resistant Protective Films: Can be used to prepare corrosion-resistant or protective films, improving device stability in complex environments.
Research and Process Development: Suitable for experimental use in research institutions for thin film structure optimization, alloy ratio control, and process parameter research.
Q1: Which sputtering equipment can NiNb sputtering targets be used with?
A1: They can be used in conventional magnetron sputtering equipment, but the specific application depends on the equipment specifications.
Q2: Can the nickel to niobium ratio of the target be adjusted?
A2: Yes, we support customizing different composition ratios according to the performance requirements of the thin film.
Q3: Is the thin film composition stable during sputtering?
A3: Under standard process conditions, the thin film composition maintains good consistency with the target.
Q4: Do you provide small-size or research-grade specifications?
A4: Yes, we support this and can provide various size options suitable for R&D and experimental stages.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We have extensive experience in the preparation of nickel-niobium alloy sputtering targets, focusing on compositional uniformity and structural density, providing highly reliable material solutions for functional thin films and microelectronic applications.
Molecular Formula: NiNb
Appearance: Silvery-white metallic target with a smooth surface
Crystal Structure: Body-centered cubic crystal structure
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
