ULPMAT

Nickel Manganese Gallium

Chemical Name:
Nickel Manganese Gallium
Formula:
NiMnGa
Product No.:
28253100
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
28253100ST001 NiMnGa 99.95% Ø 50.8 mm x 3.175 mm Inquire
Product ID
28253100ST001
Formula
NiMnGa
Purity
99.95%
Dimension
Ø 50.8 mm x 3.175 mm

Nickel Manganese Gallium Sputtering Target Overview

Nickel Manganese Gallium sputtering targets are multi-component nickel-based alloy targets primarily used for the deposition and preparation of functional alloy thin films and magneto-structural coupling-related materials.

We can provide NiMnGa sputtering targets with precise compositional ratios and dense structures, supporting various sizes and process requirements. Please contact us for technical information.

Product Highlights

Stable multi-component compositional control
Uniform alloy microstructure
Good thin film composition repeatability
Suitable for magnetron sputtering processes
High target density
Customized bonding and backplanes
Custom processing supported

Applications of Nickel Manganese Gallium Sputtering Targets

Functional Alloy Thin Film Preparation: Suitable for preparing alloy thin films with special magnetic or structural response characteristics, meeting the research and application needs of functional materials.
Smart Materials and Response Materials Research: Used to construct multi-element synergistic thin film structures in the research of smart materials and related response mechanisms.
Microstructure and Device Development: Can be used for functional layer deposition in microstructure devices, in applications requiring high consistency of film composition and structural stability.
Scientific Research and New Materials Exploration: Widely used in experimental research by research institutions in multi-element alloy systems, thin film structure control, and performance evolution.

FAQs

Q1: Which sputtering process is NiMnGa sputtering target suitable for?
A1: It can be used in conventional magnetron sputtering processes. Specific process parameters need to be optimized according to equipment conditions.

Q2: Can the ternary component ratio of the target be adjusted?
A2: Yes, customized solutions with different component ratios can be provided according to the thin film performance targets.

Q3: Is the multi-element target stable during deposition?
A3: Under reasonable power and atmosphere conditions, the target can maintain good deposition stability.

Q4: Is it suitable for research and experimental use?
A4: Yes, small sizes and non-standard specifications can be provided for R&D and verification stages.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request

Why Choose Us?

We have extensive experience in the preparation and processing of multi-component alloy sputtering targets, emphasizing compositional accuracy, structural uniformity, and process matching, which can provide reliable support for the research of functional thin films and new materials.

Molecular formula: NiMnGa
Appearance: Metallic luster, silvery-white or gray target material, smooth surface

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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