Nickel Manganese Alloy sputtering targets are nickel-manganese alloy materials used in thin film deposition processes, commonly found in the preparation of magnetic thin films and functional alloy layers.
We offer NiMn sputtering targets with controllable composition ratios and dense structures, and support customization in multiple sizes. Please contact us for detailed technical information.
Adjustable nickel-manganese ratio
Uniform alloy microstructure
Stable film composition
Suitable for magnetron sputtering processes
Customizable backplane and bonding
High target utilization rate
Good process repeatability
Magnetic Functional Thin Films: Suitable for preparing alloy thin films with specific magnetic responses, meeting the needs of magnetic property modulation applications.
Microelectronics and Device Manufacturing: Used to form stable functional alloy layers in some microelectronic devices, where high film consistency is required.
Electromagnetic Materials Research: Can serve as an important material for studying electromagnetic property modulation and for exploring novel alloy thin film structures.
Research and Process Validation: Suitable for experimental use by research institutions and R&D departments in process parameter optimization, composition ratio verification, and material performance research.
Q1: Which type of sputtering equipment is NiMn sputtering target suitable for?
A1: It can be used in common magnetron sputtering equipment. Specific compatibility needs to be confirmed based on the equipment specifications.
Q2: Can the target composition ratio be customized?
A2: Yes, target solutions with different nickel-manganese ratios can be provided according to the thin film performance targets.
Q3: Is the target prone to oxidation during use?
A3: Under standard storage and process conditions, the target surface is stable, and the oxidation risk is controllable.
Q4: Does it support small sizes or experimental specifications?
A4: Yes, suitable for various specification requirements in research and pilot-scale stages.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We focus on the processing and quality control of alloy sputtering targets, emphasizing compositional uniformity and process stability, and are able to provide customers with reliable and sustainable thin film deposition material solutions.
Molecular formula: NiMn
Appearance: Metallic luster, silvery-white or gray target material, smooth surface
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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