Nickel Iron Alloy rotary targets are primarily used in continuous thin film deposition processes, suitable for large-area magnetic functional thin films and industrial production applications.
We offer NiFe rotary targets with different composition ratios, lengths, and interface types, compatible with mainstream equipment. Contact us for technical support.
Suitable for continuous sputtering processes
High target utilization
Uniform alloy composition distribution
Good film thickness consistency
Stable thermal management performance
Supports custom bonding and backplate
Large-area magnetic thin film preparation: Suitable for magnetic thin film deposition processes requiring long-term stable operation, helping to improve production line efficiency and film consistency.
Industrial coating production: Enables stable output in continuous production lines, reducing changeover frequency, suitable for mass production of functional coatings.
Electronics and display-related materials: Can be used for functional layer deposition in electronic devices and display-related processes, in scenarios requiring high film uniformity.
Process scale-up and parameter verification: Suitable for process scale-up testing from laboratory to pilot and mass production stages, used to verify long-term deposition stability.
Q1: What are the advantages of NiFe rotating sputtering targets compared to planar targets?
A1: The rotating structure improves target utilization and facilitates a more stable continuous deposition process.
Q2: Can it be matched with rotating sputtering equipment from different brands?
A2: Yes, we can provide matching solutions based on equipment interface and size requirements.
Q3: Is the target prone to imbalance during long-term operation?
A3: Under proper installation and process conditions, the target structure is stable and can meet the requirements of long-term operation.
Q4: Do you support small-batch or pilot production needs?
A4: Yes, we can provide customized specifications suitable for the process verification stage.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We have mature experience in rotating sputtering target processing and assembly, focusing on material uniformity, structural stability, and equipment compatibility, providing reliable support for continuous deposition and mass production applications.
Molecular formula: NiFe
Appearance: Metallic luster, silvery-white or gray tubular target, smooth surface
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
