| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 282400ST001 | NiCr | 99.9% | Ø 50.8 mm x 3.175 mm | Inquire |
| 282400ST002 | NiCr | 99.95% | Ø 50.8 mm x 6.35 mm | Inquire |
| 282400ST003 | NiCr | 99.95% | Ø 76.2 mm x 3.175 mm | Inquire |
| 282400ST004 | NiCr | 99.95% | Ø 76.2 mm x 6.35 mm | Inquire |
| 282400ST005 | NiCr | 99.95% | Ø 76.2 mm x 6.35 mm | Inquire |
| 282400ST006 | NiCr | 99.95% | Ø 101.6 mm x 3.175 mm | Inquire |
| 282400ST007 | NiCr | 99.95% | Ø 101.6 mm x 6.35 mm | Inquire |
| 282400ST008 | NiCr | 99.95% | Ø 101.6 mm x 6.35 mm | Inquire |
| 282400ST009 | NiCr | 99.95% | Ø 154.2 mm x 6.35 mm | Inquire |
| 282400ST010 | NiCr | 99.95% | Ø 203.2 mm x 6.35 mm | Inquire |
| 282400ST011 | NiCr | 99.9% | 381 mm x 127 mm x 13mm | Inquire |
| 282400ST012 | NiCr | 99.9% | 377.8 mm x 120.65 mm x 6.35mm | Inquire |
Nickel Chromium Alloy sputtering targets are high-purity nickel-chromium alloy materials suitable for functional thin film deposition and electronic device fabrication.
We offer NiCr sputtering targets in various sizes, thicknesses, and structures, and support equipment matching and process optimization. Contact us for customized solutions and technical information.
High purity and stability
Excellent target density
Good film uniformity
Stable discharge performance
Compatible with various sputtering systems
Customizable backplanes and bonding
High batch consistency
Electronic Device Thin Film Deposition: NiCr targets can be used for the preparation of conductive and functional thin films, ensuring film uniformity and stable electronic device performance.
High Temperature and Corrosion-Resistant Thin Films: Suitable for high-temperature or corrosion-resistant thin film deposition, improving film durability and stability.
Functional Layers in Composite Materials: Functional layers can be deposited in multilayer composite materials, improving conductivity, magnetism, and thermal stability.
Scientific Research and Process Development: NiCr targets are suitable for thin film process experiments and new material research and development, ensuring repeatable deposition results.
FAQs
Q1: What are the main applications of NiCr sputtering targets?
A1: Commonly used in thin films for electronic devices, high-temperature corrosion-resistant thin films, functional layers of composite materials, and scientific research experiments.
Q2: Are NiCr targets compatible with different sputtering equipment?
A2: Yes, we offer various sizes and structures compatible with mainstream sputtering systems.
Q3: Are targets prone to problems during sputtering?
A3: High-density targets ensure discharge stability and reduce uneven deposition or target loss.
Q4: How should NiCr sputtering targets be stored?
A4: It is recommended to store them in a dry, sealed container, avoiding impact or moisture to maintain target performance stability.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We have extensive experience in supplying functional sputtering targets, providing high-density, high-purity NiCr targets and customized services, supplemented by comprehensive technical support, to help customers achieve stable and efficient deposition results in electronic devices and functional thin film applications.
Molecular formula: NiCr
Appearance: Metallic silver-gray target material
Crystal structure: Face-centered cubic crystal structure
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
