ULPMAT

Nickel Aluminum Alloy

Chemical Name:
Nickel Aluminum Alloy
Formula:
NiAl
Product No.:
281301
CAS No.:
12635-27-7
EINECS No.:
682-897-4
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
281301ST001 NiAl 99.95% Ø 101.6 mm x 6.35 mm Inquire
281301ST002 NiAl 99.95% Ø 101.6 mm x 6.35 mm Inquire
Product ID
281301ST001
Formula
NiAl
Purity
99.95%
Dimension
Ø 101.6 mm x 6.35 mm
Product ID
281301ST002
Formula
NiAl
Purity
99.95%
Dimension
Ø 101.6 mm x 6.35 mm

Nickel Aluminum Alloy Sputtering Targets Overview 

Nickel Aluminum Alloy sputtering targets are high-purity nickel-aluminum alloy materials primarily used for functional thin film deposition and the fabrication of high-performance electronic devices.

We offer NiAl sputtering targets in various sizes, thicknesses, and structures, and support equipment matching and technical guidance. Contact us for customized solutions.

Product Highlights

High purity and stability
High target density
Good film uniformity
Stable discharge performance
Compatible with various sputtering equipment
Customizable bonding and backplanes
High batch consistency

Applications of Nickel Aluminum Alloy Sputtering Targets

Electronic Device Thin Film Deposition: NiAl sputtering targets can be used for the preparation of conductive or functional thin films, ensuring stable performance and film uniformity in electronic devices.
High-Temperature Functional Thin Films: Suitable for thin film deposition in high-temperature applications, improving the heat resistance and structural stability of the film.
Composite Material Coating: Functional layers can be deposited in multilayer composite materials, improving the conductivity and thermal stability of the composite material.
Scientific Research and Process Development: NiAl targets are suitable for thin film process experiments and new material development, helping to achieve repeatable deposition results in the R&D stage.

FAQs

Q1: In which fields are NiAl sputtering targets mainly used?
A1: Commonly used in electronic devices, functional thin films, high-temperature thin films, and scientific research experiments.

Q2: Can NiAl targets be adapted to different sputtering equipment?
A2: Yes, we offer different sizes and structures to match mainstream sputtering systems.

Q3: Are targets prone to problems during sputtering?
A3: High-density targets ensure discharge stability, thereby reducing the risk of uneven deposition during sputtering.

Q4: How should NiAl sputtering targets be stored?
A4: It is recommended to store them in a dry, sealed container, avoiding impact or moisture to maintain target performance.

Report

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request

Why Choose Us?

We have extensive experience in high-performance sputtering targets, providing stable NiAl target quality and customized services, coupled with comprehensive technical support, to help customers achieve stable and efficient deposition results in electronic devices and thin film applications.

Molecular Formula: NiAl
Appearance: Silvery-white or grayish-white powder
Crystal Structure: Cubic crystal structure

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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