Molybdenum Tungsten Alloy sputtering targets are alloyed from molybdenum and tungsten in a specific ratio. They possess a high melting point, excellent thermal stability, and superior hardness, making them crucial materials for preparing high-temperature resistant thin films, diffusion barrier layers, and functional coatings. They are widely used in semiconductor manufacturing, optoelectronic thin film technology, hard coating preparation, and industrial coating applications, and are suitable for demanding vacuum deposition environments.
We can produce MoW sputtering targets in various ratios, purities, and sizes, including circular targets, rectangular targets, curved targets, segmented targets, and complete target assemblies. We support customized processes, including density enhancement, backplane bonding, vacuum polishing, and surface optimization treatments. Please feel free to contact us.
High-density material, excellent film uniformity
Strong resistance to high-temperature thermal shock
Tungsten content ratio can be adjusted according to process requirements
Supports customization of various target structures and sizes
Stable sputtering rate and good adhesion
Strong vacuum compatibility, less prone to film contamination
Used for deposition of diffusion barrier layers and high-temperature resistant films in semiconductor processes.
Applied to the hard coating industry, such as tool coatings and wear-resistant films.
Used for the preparation of functional and structural films in the optoelectronic industry.
Used for deposition of corrosion-resistant films in precision instruments and industrial coating equipment.
Q1: What packaging method is used for MoW sputtering targets?
A1: We use a combination of vacuum sealing and shockproof outer packaging to ensure that the targets remain clean and undamaged during transportation.
Q2: Can you provide international shipping? How long does the delivery time take?
A2: Yes, we ship via international express couriers such as DHL, UPS, and FedEx, typically delivering to most countries and regions within 3–7 days, with real-time tracking information available.
Q3: How do you guarantee the purity and composition of MoW sputtering targets?
A3: Each batch of sputtering targets undergoes ICP, GDMS, or XRF testing to ensure that composition and impurities are controlled within strict limits, and corresponding test reports are available.
Q4: Can you provide sputtering target processing services, such as custom sizes or bonding?
A4: Yes, we support precision machining, surface treatment, backplane bonding, and custom shapes to ensure complete compatibility between the sputtering target and the customer’s equipment.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request.
We possess advanced powder metallurgy and hot isostatic pressing (HIP) technologies, enabling us to stably produce high-density, high-uniformity MoW sputtering targets. With mature production experience, fast delivery times, rigorous quality control, and flexible customization services, we have long-term supply relationships with numerous optoelectronic, semiconductor, and vacuum coating companies worldwide. Choosing us ensures stable and reliable material quality, competitive pricing, and professional technical support, making us your ideal partner for developing high-performance thin film materials.
Chemical formula: MoW
Appearance: Dense silver-gray metallic disk or rectangular target with a smooth surface
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
