| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 421601ST001 | MoS2 | 99.9% | Ø 50.8 mm x 3.175 mm | Inquire |
| 421601ST002 | MoS2 | 99.9% | Ø 50.8 mm x 6.35 mm | Inquire |
| 421601ST003 | MoS2 | 99.95% | Ø 25.4 mm x 6.35 mm | Inquire |
| 421601ST004 | MoS2 | 99.95% | Ø 76.2 mm x 6.35 mm | Inquire |
| 421601ST005 | MoS2 | 99.95% | Ø 101.6 mm x 6.35 mm | Inquire |
| 421601ST006 | MoS2 | 99.95% | Ø 203.2 mm x 6.35 mm | Inquire |
Molybdenum Sulfide sputtering targets are high-performance two-dimensional material preparation targets with excellent chemical stability and low friction properties, suitable for high-precision thin film deposition. They are applicable to the deposition of semiconductor devices, wear-resistant coatings, optoelectronic devices, and new energy materials, providing a reliable material foundation for scientific research and industrial production.
We offer high-purity Molybdenum Sulfide sputtering targets in multiple sizes, and can customize thickness and diameter according to customer needs. Contact us for samples and quotations.
High purity
High density, stable performance
Excellent thin film deposition uniformity
High temperature and chemical corrosion resistance
Low friction properties
Target bonding service available
Customizable sizes and shapes
Semiconductor Devices: Used for high-precision conductive or functional thin film deposition.
Wear-resistant Coatings: Form wear-resistant films on the surface of mechanical parts, extending service life.
Optoelectronic Devices: Can deposit functional thin films for photodetectors and photovoltaic elements.
New Energy Devices: Used in the manufacture of thin films for lithium batteries, solar cells, etc.
Q1: What are the packaging options for our products?
A1: We offer sealed bags, vacuum packaging, and customized moisture-proof boxes to ensure safe transportation.
Q2: Can the products be processed or customized in size?
A2: Yes, we can cut, drill, or adjust the thickness according to customer needs.
Q3: What are the storage requirements for MoS2 sputtering targets?
A3: They should be stored in a dry, cool, and dark environment to avoid the effects of high temperatures and humidity on material properties.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request.
Extensive Experience: Years of experience in thin film target R&D and production.
Strict Quality Management: High purity, high density; every batch of products passes rigorous testing.
Highly customizable: Targets can be customized according to size, thickness, and shape.
Comprehensive technical support: We provide professional guidance throughout the entire process, from selection to application.
Choose us to obtain high-performance MoS₂ sputtering targets and comprehensive technical support, ensuring film deposition quality and production efficiency.
Chemical Formula: MoS2
Molecular Weight: 160.07 g/mol
Appearance: Dark gray, dense, blocky, disc-shaped or rectangular target material with a smooth surface
Density: ≈ 5.06 g/cm³
Melting Point: ≈ 1185 °C (Decomposes in air under an inert atmosphere)
Boiling Point: ≈ 2200 °C (Decomposes at high temperatures)
Crystal Structure: Hexagonal close-packed crystal system (HCP, layered structure)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
