Molybdenum silicon alloy sputtering targets are intermetallic compound targets composed of molybdenum and silicon, exhibiting excellent thermal stability, electrical properties, and oxidation resistance. Their deposited films possess good conductivity, heat resistance, and adhesion, making them widely used in the manufacture of semiconductor thin films, resistive materials, barrier layer coatings, and optoelectronic components. They are commonly used high-performance targets in advanced thin-film processes.
We offer MoSi sputtering targets in various composition ratios, purity grades, and shapes. We can provide customized sizes, vacuum hot pressing, HIP densification, backplane bonding, and other processing services according to customer equipment requirements. Please contact us for the latest pricing.
High density, excellent film uniformity
Extremely low impurity content, few film particles
Customizable composition ratios and dimensions supported
Stable electrical properties, suitable for precision thin films
Compatible with various magnetron sputtering equipment
Supports target bonding services
Surface can be finely polished to a mirror finish
Used for barrier layer and conductive film deposition in semiconductor devices.
Used for functional coating preparation of optical components and optoelectronic thin films.
Used as a key target in resistive thin films and thermally stable materials.
Used in MEMS, sensors, and microelectronic packaging films.
Q1: What packaging method is used for MoSi targets?
A1: Each target is sealed in a dust-free bag and packaged with shockproof foam and a rigid protective box to prevent moisture or abrasion during transportation.
Q2: Can the targets be processed into special sizes or used for backplane bonding?
A2: Yes, we offer CNC machining, surface polishing, titanium/copper backplate bonding, and custom non-standard shape processing services to match the cavity dimensions of different equipment.
Q3: How should MoSi sputtering targets be stored correctly?
A3: It is recommended to store them in a dry, sealed environment. Avoid touching the target surface before use. For long-term storage, add desiccant and keep the area dust-free.
Q4: How do you guarantee the purity of the sputtering targets and the quality of the thin film?
A4: All sputtering targets use high-purity raw materials and undergo rigorous testing including ICP, XRF, and density testing. A complete quality report can be included with the shipment.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request.
With years of experience in manufacturing intermetallic compound sputtering targets, we possess advanced powder metallurgy equipment, hot isostatic pressing (HIP) processes, and precision machining technologies. This allows us to reliably supply high-density, high-purity MoSi sputtering targets with low particle counts. We offer fast delivery times, rigorous quality control, stable global logistics support, and a professional engineering team to ensure our customers receive reliable thin film performance and continuous supply. Whether for research or large-scale manufacturing, we are a trustworthy long-term partner.
Chemical formula: MoSi
Appearance: Dense, silvery-gray disc-shaped or rectangular target material with a smooth surface
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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