| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 420801ST001 | MoO3 | 99.9% | Ø 50.8 mm x 3.175 mm | Inquire |
| 420801ST002 | MoO3 | 99.9% | Ø 76.2 mm x 3.175 mm | Inquire |
| 420801ST003 | MoO3 | 99.9% | Ø 101.6 mm x 3.175 mm | Inquire |
| 420801ST004 | MoO3 | 99.99% | Ø 50.8 mm x 3.175 mm | Inquire |
| 420801ST005 | MoO3 | 99.99% | Ø 76.2 mm x 3.175 mm | Inquire |
| 420801ST006 | MoO3 | 99.99% | Ø 101.6 mm x 3.175 mm | Inquire |
Molybdenum Oxide sputtering targets are high-purity metal oxide targets with excellent chemical stability and good thin film deposition performance. Their high density and uniform structure make them outstanding in precision thin film preparation. They are widely used in optoelectronic devices, transparent conductive films, catalytic coatings, and new energy devices, providing a reliable high-performance target option for scientific research and industrial production.
We offer high-purity MoO3 sputtering targets of various sizes, and can customize thickness, diameter, and shape according to customer needs. Contact us for samples and quotations, and let our professional team provide full technical support for your research or industrial projects.
High Purity
High Density, Uniform Deposition
Excellent Film Adhesion
Stable Chemical and Thermal Properties
Customizable Sizes and Shapes
Target Bonding Processing
Suitable for High-Precision Sputtering Deposition
Optoelectronic Devices: Used for manufacturing high-performance transparent conductive films.
Catalytic Coatings: Provide stable catalytic activity in chemical reactions.
New Energy Devices: Used for thin-film deposition in solar cells and energy storage devices.
Precision Thin-Film Preparation: Improves the performance and stability of optical devices and sensors.
Q1: What are the packaging options for MoO3 sputtering targets?
A1: Vacuum packaging or customized moisture-proof containers are available to ensure safe transportation.
Q2: Can the product be customized?
A2: Yes, we can cut, drill, or adjust the thickness according to customer needs to adapt to different equipment.
Q3: What precautions should be taken when storing MoO3 targets?
A3: Store in a dry, cool environment, avoiding humid and strongly acidic or alkaline environments to maintain target performance stability.
Q4: How is product purity and performance guaranteed?
A4: Each batch of targets undergoes rigorous analysis and performance testing to ensure high purity, density, and uniformity, and a complete test report is provided.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request.
Experienced Expertise: Years of experience in the R&D and production of high-purity MoO₃ sputtering targets; mature and reliable technology.
Strict Quality Management: High purity, high packing density; every batch of products passes rigorous testing.
Strong Customization Capabilities: Customization available according to thickness, diameter, shape, and performance requirements.
Comprehensive Technical Support: We provide sample selection, process guidance, and application solution support.
Choose us to obtain high-performance MoO₃ sputtering targets and professional technical support for more efficient and stable thin film deposition.
Chemical Formula: MoO3
Molecular Weight: 143.94 g/mol
Appearance: Light yellow to yellow disc-shaped or rectangular target material
Density: 4.69 g/cm³
Crystal Structure: Orthorhombic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
