| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 4200ST001 | Mo | 99.95% | Ø 50.8 mm x 3.175 mm | Inquire |
| 4200ST002 | Mo | 99.99% | Ø 100 mm x 6mm | Inquire |
| 4200ST003 | Mo | 99.99% | Ø 101.6 mm x 6.35 mm | Inquire |
| 4200ST004 | Mo | 99.99% | Ø 110 mm x 5mm | Inquire |
| 4200ST005 | Mo | 99.95% | Ø 152.4 mm x 6.35mm | Inquire |
| 4200ST006 | Mo | 99.95% | Ø 237 mm x 15mm | Inquire |
| 4200ST007 | Mo | 99.99% | Ø 32.5 mm x 13mm | Inquire |
| 4200ST008 | Mo | 99.95% | 167 mm x 167 mm x 8mm | Inquire |
| 4200ST009 | Mo | 99.99% | 622 mm x 132 mm x 18mm | Inquire |
Molybdenum Metal sputtering targets are high-purity metal targets with excellent electrical and thermal conductivity and mechanical strength, widely used in magnetron sputtering, thin film fabrication for electronic devices, and industrial coating deposition. Their stable physical properties and high sputtering efficiency make them a reliable target choice for scientific research and industrial production.
We offer a variety of Molybdenum Metal sputtering targets in various sizes, purity grades, and with customized backplates. We also support target finishing, surface polishing, and bulk supply. Contact us for samples, quotations, or technical advice.
High-purity metal targets
Excellent electrical and thermal conductivity
High mechanical strength and durability
Smooth surface, suitable for precision sputtering
Batch stability, ensuring film uniformity
Customizable sizes and backplate types
Supports industrial mass production and research needs
Fast delivery and technical support
For high-performance electronic device thin film deposition.
For preparing conductive films.
Applications include optical reflective coatings and decorative coatings.
Used for thin film preparation in scientific research laboratories and industrial sputtering equipment.
Q1: What forms can the sputtering targets be processed into?
A1: We offer round, square, and irregularly shaped sputtering targets, and also support backplate bonding, surface polishing, and thickness calibration.
Q2: What precautions should be taken when storing the sputtering targets?
A2: They should be stored in a dry, ventilated, and non-corrosive environment, avoiding moisture, oxidation, and mechanical damage to ensure target surface quality.
Q3: What are the main advantages of Molybdenum Metal sputtering targets?
A3: Their high purity, excellent electrical and thermal conductivity ensure uniform sputtering and stable film quality, while also providing strong mechanical properties and a long lifespan.
Q4: What additional services can you provide?
A4: These include technical consultation, sputtering process optimization suggestions, size customization, fast delivery, and long-term bulk supply services.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request.
We possess a comprehensive sputtering target manufacturing and quality control system, ensuring stable performance for each batch of targets.
We can customize dimensions, purity, and backplates according to customer sputtering systems to meet the needs of scientific research and industrial applications.
We provide detailed testing reports to ensure product traceability and enhance user confidence.
Our technical team provides full support, including material selection, process guidance, and usage optimization.
Our rapid delivery and long-term supply capabilities ensure stable support for customers in both R&D and mass production.
Chemical Formula: Mo
Atomic Weight: 95.95 g/mol
Appearance: Gray metallic round or rectangular target
Density: 10.28 g/cm³ (solid)
Melting Point: 2623 °C
Boiling Point: 4639 °C
Crystal Structure: Body-Centered Cubic (BCC)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
