Molybdenum carbide sputtering targets are functional materials possessing high hardness, excellent wear resistance, and superior chemical stability. They are commonly used to prepare high-performance coatings, wear-resistant thin films, conductive layers, and electronic structural films. Their thermal stability and film uniformity make them ideal for advanced thin film technology and industrial coating applications.
We supply Molybdenum carbide sputtering targets in various purities, structures, and custom sizes, and support backplane bonding, precision machining, and batch delivery services. Contact us immediately for technical support.
Excellent high-temperature stability
High wear resistance and hardness
Excellent thin film adhesion performance
Consistent film structure
Low impurity content and controllable purity
Custom sizes and backplane types available
Batch stability, suitable for mass production coating
Controllable sputtering rate and uniform film layer
Used for preparing wear-resistant and corrosion-resistant thin film coatings.
Used for functional film deposition in electronic devices.
Achieving enhanced coating in the tooling and mold-making industries.
Used for high-performance electrocatalytic films and research-oriented thin film development.
Q1: What types of Molybdenum Carbide targets can you process?
A1: We can process round targets, rectangular targets, and arc targets, and provide a range of advanced processing services including precision grinding, chamfering, and backing bonding.
Q2: What precautions should be taken when storing targets?
A2: Targets should be placed in sealed, moisture-proof packaging, avoiding collisions with hard objects, and kept in a clean environment to protect the target surface quality.
Q3: What are the main advantages of this target?
A3: It possesses excellent high-temperature resistance, stable sputtering performance, and strong wear resistance, making it ideal for coating processes with high thin film quality requirements.
Q4: What additional services can you provide?
A4: We can provide technical consultation, sputtering parameter advice, target repair services, and flexible delivery support for bulk orders.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports are available upon request.
We possess mature sputtering target production technology, ensuring stable and uniform target materials.
We can customize formulations and structures according to customer processes, making our products compatible with various sputtering systems.
Each target undergoes rigorous testing to ensure high purity and consistency.
We provide stable supply capabilities to meet the needs of research institutions, small-batch orders, and industrial mass production.
Our professional team can provide you with comprehensive support from material selection to application, improving thin film preparation efficiency.
Chemical Formula: Mo₂C
Molecular Weight: 203.88 g/mol
Appearance: Grayish-black metallic disk or rectangular target
Density: Approximately 9.0–9.1 g/cm³
Melting Point: ≈ 2690 °C
Crystal Structure: Hexagonal close-packed (HCP) or partially polycrystalline cubic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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