| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 2500ST001 | Mn | 99.8% | Ø 25.4 mm x 3.175 mm | Inquire |
| 2500ST002 | Mn | 99.8% | Ø 25.4 mm x 6.35 mm | Inquire |
| 2500ST003 | Mn | 99.8% | 300 mm x 100 mm x 6mm | Inquire |
| 2500ST004 | Mn | 99.95% | Ø 50.8 mm x 3.175 mm | Inquire |
| 2500ST005 | Mn | 99.99% | Ø 50.8 mm x 3.175 mm | Inquire |
| 2500ST006 | Mn | 99.95% | Ø 50.8 mm x 6.35 mm | Inquire |
| 2500ST007 | Mn | 99.99% | Ø 50.8 mm x 6.35 mm | Inquire |
| 2500ST008 | Mn | 99.99% | Ø 76.2 mm x 6.35 mm | Inquire |
| 2500ST009 | Mn | 99.99% | Ø 76.2 mm x 6.35 mm | Inquire |
Manganese metal sputtering targets are high-purity metal targets used in physical vapor deposition (PVD) processes to form high-quality thin films. This material has important applications in advanced electronics manufacturing, optical coating, and functional surface treatment.
We can provide high-purity manganese targets in custom sizes. Please contact us.
Excellent thin film deposition performance
High density and purity options available
Customizable shapes
Customizable bonding and backplanes
Excellent thermal conductivity and electrical stability
Compatible with various sputtering equipment
Strict quality control system.
Semiconductor Manufacturing and Integrated Circuits: Manganese sputtering targets can be used to deposit uniform, high-performance metal thin layers on substrates such as silicon wafers, making them an important raw material for integrated circuit and semiconductor processes.
Display and Electronic Device Coating: In the manufacturing of flat panel displays, OLED/LED display components, and touch devices, manganese targets are used to deposit functional thin films to improve performance and reliability.
Sensor and Storage Media Fabrication: Used to fabricate metal thin films for magnetic storage media and various sensor components, improving product stability and response performance.
Optical and Decorative Coatings: In optical thin film and decorative coating processes, sputtering deposition improves scratch resistance and surface uniformity, suitable for applications such as mirrors and architectural glass.
Q1: Which deposition processes are suitable for manganese sputtering targets?
A1: Manganese sputtering targets are mainly used in physical vapor deposition techniques such as magnetron sputtering to form high-quality metal thin films.
Q2: How does the purity of the sputtering target affect the film quality?
A2: Higher target purity helps reduce impurities in the film, improving its electrical and physical properties, thus meeting higher process requirements.
Q3: Can you provide non-standard sized targets?
A3: We support customizing target shapes and sizes according to customer equipment specifications, compatible with different models and process platforms.
Q4: How to choose a backplane or bonding method for the product?
A4: Appropriate backplanes and bonding methods, such as indium bonding, can be selected based on the type of sputtering equipment and heat treatment conditions to improve sputtering stability and heat dissipation.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We possess a mature target processing and testing system, giving us advantages in material purity, dimensional control, and batch supply. We also provide professional technical support and timely response services to help our clients achieve stable production and high-quality film preparation.
Molecular Formula: Mn
Molecular Weight: 54.94 g/mol
Appearance: Silver-gray target material
Density: 7.21 g/cm³
Melting Point: 1244 °C
Boiling Point: 2095 °C
Crystal Structure: Cubic-centered (BCC, α-Mn)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
