| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 250803ST001 | MnO2 | 99.95% | Ø 25.4 mm x 3.175 mm | Inquire |
| 250803ST002 | MnO2 | 99.95% | Ø 50.8 mm x 3.175 mm | Inquire |
| 250803ST003 | MnO2 | 99.95% | Ø 50.8 mm x 6.35 mm | Inquire |
| 250803ST004 | MnO2 | 99.95% | Ø 76.2 mm x 3.175 mm | Inquire |
| 250803ST005 | MnO2 | 99.99% | Ø 25.4 mm x 3.175 mm | Inquire |
Manganese Oxide sputtering targets are widely used in magnetron sputtering (PVD) processes for the preparation of high-quality thin films. These targets are commonly used in electronics, glass, and ceramics industries, exhibiting excellent electrochemical performance and durability.
We offer MnO2 sputtering targets in various purities, particle sizes, and custom specifications to meet diverse application needs. Please contact us for more technical information and quotations.
High-purity targets
Excellent electrochemical performance
High temperature resistance
Stable thin film deposition
Suitable for various sputtering equipment
Customized services
Strict quality control
Long-term supply guarantee
Electronic Components and Semiconductors: Used in the manufacture of transparent conductive thin films, memory devices, and sensor components, widely used in the semiconductor industry. Its electrochemical stability and high conductivity ensure long-term device performance.
Glass and Ceramic Coatings: Used in the manufacturing process of glass and ceramics to form decorative or functional coatings, improving the color, optical properties, and corrosion resistance of products.
Optoelectronics and Energy Equipment: Widely used in optoelectronic materials and energy equipment, particularly to improve the conductivity and stability of photovoltaic devices and enhance their energy conversion efficiency.
Environmental Catalysis: Due to its excellent catalytic performance, it is also used in the catalysis field, playing a crucial role, especially in gas treatment and pollutant decomposition.
Q1:What are the main applications of MnO2 sputtering targets?
A1: Mainly used in the electronics, glass, ceramics, and energy equipment fields, widely used in thin film deposition, optoelectronic materials, and catalysts.
Q2: How to choose the appropriate purity for MnO2 sputtering targets?
A2: When selecting target purity, it is necessary to consider the specific application requirements. Semiconductor and electronics applications generally require higher purity, while ceramics and glass applications require lower purity.
Q3:What types of sputtering equipment are suitable for Manganese Oxide sputtering targets?
A3:Suitable for both DC and RF sputtering equipment, meeting the deposition needs of different applications.
Q4: How to store MnO2 sputtering targets?
A4: Store in a dry, cool, and dark environment, avoiding contact with moisture or strong oxidizers to ensure chemical stability and service life.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We are committed to providing high-quality MnO2 sputtering targets, strictly controlling the quality of each batch to ensure its stability and consistency. Through customized services and comprehensive after-sales support, we help customers achieve superior performance in various technical applications, ensuring the stability of long-term partnerships.
Molecular Formula: MnO₂
Molecular Weight: 86.94 g/mol
Appearance: Dark brown target material
Density: 5.03 g/cm³
Melting Point: 535 °C (decomposes)
Crystal Structure: Tetragonal (Rutile type)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
