Manganese iron oxide sputtering targets are high-density ceramic targets made of a composite oxide (spinel iron-manganese oxide) used in physical vapor deposition (PVD) processes to form functional thin films. These targets are widely used in the manufacture of magnetic thin films, electronic devices, and optical functional coatings, providing a stable film-forming foundation for advanced materials preparation.
We offer MnFe2O4 sputtering targets in various purities and sizes. Please contact us for technical details and customized quotes.
High-purity oxide target
Stable spinel structure
Excellent density
Compatible with various magnetron sputtering equipment
Custom sizes and shapes supported
Good film formation consistency
Stable batch supply
Strict quality control system.
Magnetic Thin Film Deposition: Using MnFe2O4 targets to deposit magnetic thin films in magnetron sputtering equipment, it can be used in the manufacture of magnetic thin film components such as magnetic storage and magnetic sensors.
Electronic and Semiconductor Device Fabrication:This sputtering target is suitable for forming high-quality functional thin films on silicon wafers, glass, or other substrates, and can be used in electronic device manufacturing, integrated circuits, and microelectronic components.
Optoelectronic Functional Material Thin Films:*Used for film formation in optoelectronic device production, such as for transparent magnetic layers or thin film materials with specific optical properties, providing basic materials for displays, optical communications, etc.
Research and Thin Film Development:In research laboratories, MnFe2O4 sputtering targets are used to develop novel magnetic or functional thin film materials, and are an indispensable source material for thin film research in materials science.
Q1:What is a Manganese Iron Oxide sputtering target?
A1: A MnFe2O4 sputtering target is a spinel-structured composite ceramic target composed of manganese and iron oxides, used in thin film deposition processes such as magnetron sputtering.
Q2:Which sputtering methods is this target suitable for?
A2:It can be used for magnetron sputtering (including RF, DC, etc.), depending on the equipment and process requirements. The dense structure of the target helps stabilize film formation.
Q3: Why is a high-density sputtering target needed?
A3: High density reduces porosity and cracks, lowering the risk of target breakage during sputtering and improving film consistency and quality.
Q4: How does the purity of the target composition affect film performance?
A4: Higher purity targets help reduce impurities. A lower impurity content in the film improves electrical, magnetic, and optical properties, as well as process stability.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We possess an advanced sputtering target manufacturing and testing system. From raw material selection and powder preparation to molding, sintering, and post-processing, we employ strict process control to ensure the high purity and consistency of MnFe₂O₄ targets. We also support customized specifications and provide professional technical consultation and comprehensive after-sales service, offering customers a reliable material foundation for thin film preparation processes.
Molecular Formula: MnFe₂O₄
Molecular Weight: 228.81 g/mol
Appearance: Black
Density: 5.0 g/cm³
Melting Point: 1590 °C
Crystal Structure: Cubic (Spinnel type)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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