| Product ID | Formula | Purity | Dimension | Inquiry |
|---|---|---|---|---|
| 250802ST001 | MnO | 99.9% | Ø 25.4 mm x 3.175 mm | Inquire |
| 250802ST002 | MnO | 99.9% | Ø 25.4 mm x 6.35 mm | Inquire |
| 250802ST003 | MnO | 99.9% | Ø 50.8 mm x 3.175 mm | Inquire |
| 250802ST004 | MnO | 99.9% | Ø 50.8 mm x 6.35 mm | Inquire |
| 250802ST005 | MnO | 99.9% | Ø 76.2 mm x 3.175 mm | Inquire |
| 250802ST006 | MnO | 99.95% | Ø 50.8 mm x 3.175 mm | Inquire |
| 250802ST007 | MnO | 99.95% | Ø 50.8 mm x 6.35 mm | Inquire |
| 250802ST008 | MnO | 99.95% | Ø 76.2 mm x 6.35 mm | Inquire |
Manganese(II) Oxide sputtering targets are made of monovalent manganese oxide (MnO) and are commonly used in magnetron sputtering (PVD) processes to produce high-quality thin film materials. These targets are widely used in the manufacture of electronics, ceramics, glass, and other high-performance materials.
We offer Manganese Oxide sputtering targets in various sizes, purities, and custom specifications to meet diverse thin film deposition needs. Please contact us.
High-purity target
Dense structure
Strong chemical stability
Uniform particle size
Customizable sizes
Suitable for high-precision sputtering
Compatible with various sputtering equipment
Strict quality control
Electronic Devices and Semiconductor Fabrication: Used for thin film deposition of semiconductor components, especially suitable for manufacturing transparent conductive films, memory devices, and sensor elements.
Ceramics and Glass Industry: Commonly used in the manufacture of ceramics and glass to deposit decorative or functional thin films, helping to improve the color and performance of products.
Battery and Energy Storage Materials: MnO, as an important component of battery materials, is frequently used in the research and development of lithium-ion battery cathode materials, helping to improve the energy storage performance and stability of batteries.
Surface Coatings and Protective Films: Manganese Oxide sputtering targets can be used to prepare wear-resistant and corrosion-resistant surface coatings, widely used for surface modification of materials such as metals and plastics.
Q1: What are the main uses of this targets?
A1: Primarily used for depositing thin films in magnetron sputtering technology, widely applied in electronics, ceramics, and glass industries.
Q2: What types of sputtering equipment are suitable for MnO sputtering targets?
A2: Suitable for both DC and RF sputtering equipment, meeting the deposition requirements of different applications.
Q3: How to select the purity requirements for MnO sputtering targets?
A3: When selecting target purity, it is necessary to consider the specific application requirements. Higher purity is required in the electronics and semiconductor fields, while lower purity is generally required for ceramic or glass applications.
Q4: Do MnO sputtering targets require special storage conditions?
A4: They should be stored in a dry, well-ventilated, and light-protected environment, avoiding contact with water or strong oxidants to ensure their stability.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We are committed to providing high-purity, high-quality MnO sputtering targets. Our rigorous quality control system ensures the consistency and performance stability of each batch. We also offer customized services to meet different customer needs. Our technical team provides comprehensive support and consultation to ensure the effective application of our products in various high-performance thin film preparations.
Molecular Formula: MnO
Molecular Weight: 70.94 g/mol
Appearance: Black
Density: 5.36 g/cm³
Crystal Structure: Cubic (NaCl type)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
