Manganese Germanium Alloy sputtering targets are high-purity thin film deposition materials made of a manganese (Mn) and germanium (Ge) alloy, used in physical vapor deposition (PVD) processes to generate high-quality thin films. These targets are suitable for the fabrication of thin films in electronic, optical, and magnetic materials, and are important raw materials for the preparation of advanced functional thin films.
We can provide Manganese Germanium Alloy sputtering targets of different purities, sizes, and shapes according to customer process requirements. Please contact us for technical support and customized quotations.
High-purity alloy target
Excellent chemical stability
Compatible with various PVD equipment
Dense crystalline structure
Customizable sizes and shapes
Good film formation consistency
Stable batch supply
Strict quality control system
Semiconductor and Microelectronic Thin Film Preparation: MnGe targets are used in magnetron sputtering systems to prepare functional thin films, which can be used in the fabrication of integrated circuits, electrode layers, and microelectronic devices to improve device stability and performance.
Magnetic Thin Films and Magnetic Storage Materials: Used for depositing thin film materials with magnetic properties, meeting the needs for magnetic property control in magnetic storage devices and sensor assemblies.
Optical Thin Films and Optoelectronic Devices: MnGe thin films can be used for optical coatings and surface function improvement in optoelectronic devices, suitable for display and optical sensing applications.
Research and Materials Development: In scientific research experiments and new material development, MnGe targets are used as source materials to explore novel thin film properties and prepare functional materials.
Q1: What are the main components of a Manganese Germanium Alloy sputtering target?
A1: MnGe sputtering targets are metal compound targets made of high-purity manganese and germanium alloys, used for thin film deposition.
Q2: Which sputtering processes is this target suitable for?
A2: This target can be used in physical vapor deposition techniques such as magnetron sputtering, and can be applied in both DC and RF systems.
Q3: How to choose the appropriate target size and shape?
A3: The size and shape of the target should be determined based on the equipment specifications and deposition area requirements. We can customize according to customer design requirements.
Q4: Why is a high-purity alloy target needed?
A4: High-purity alloy targets can reduce impurities in the thin film, improving the physical property stability and device performance consistency.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We possess an advanced target manufacturing and testing system. From raw material selection and alloy preparation to molding, sintering, and post-processing, we strictly control quality to ensure the high purity and consistency of MnGe sputtering targets. We also support customized specifications and professional technical support, providing a stable and reliable material foundation for customers’ thin film preparation processes.
Molecular Formula: MnGe
Molecular Weight: 125.75 g/mol
Appearance: Silver-gray
Density: 7.0 g/cm³
Crystal Structure: Cubic (B20 type)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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