Manganese Cobalt Alloy sputtering targets are high-purity metal or alloy targets made of manganese (Mn) and cobalt (Co), specifically designed for forming uniform thin films in physical vapor deposition (PVD) systems. These alloy targets play a crucial role in the fabrication of electronic, magnetic materials, and advanced functional thin films, and can be used in semiconductor devices, magnetic storage, and other precision film layering processes.
We offer Manganese Cobalt Alloy targets in various composition ratios and sizes, and can customize them to meet your process requirements. Please contact us.
High-purity material
Uniform and dense alloy
Suitable for DC and RF sputtering
Customizable shape and size
Excellent thermal stability
High film consistency
Suitable for complex film layering systems
Stable batch supply.
Semiconductor Thin Film Fabrication: MnCo targets are used in magnetron sputtering systems to deposit metal or alloy thin films, providing a stable material base for integrated circuit interconnects, electrodes, and functional layers.
Magnetic Storage Devices: This alloy target can be used to fabricate magnetic thin-film components, improving the magnetic response performance and stability of data storage media, making it an important material in the magnetic storage industry.
Sensors and Microelectronic Devices: In the manufacturing of microelectronic components such as sensors and MEMS, functional films deposited using MnCo targets can optimize device sensitivity and electrical performance.
Advanced Functional Thin Films and Optoelectronic Devices: Used to prepare thin-film materials with special electrical, magnetic, or chemical functions, suitable for thin-film applications in display, optoelectronics, and new energy fields.
Q1: What are the typical composition combinations of MnCo sputtering targets?
A1: MnCo targets are typically an alloy system of manganese and cobalt. The ratio of the two metals and the target composition can be adjusted according to specific thin-film requirements.
Q2: Which sputtering processes is this target suitable for?
A2: It is compatible with DC and RF magnetron sputtering equipment and suitable for various PVD sputtering deposition processes.
Q3: Can the target size and shape be customized?
A3: Yes, targets can be customized in round, square, or specific sizes to meet the needs of different equipment and processes.
Q4: How does the purity of alloy targets affect film deposition performance?
A4: High-purity targets can reduce the impurity content in the film, improve the electrical and magnetic properties of the film, and enhance product consistency.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We possess mature target development and processing capabilities, strictly control material purity and structural consistency, and can customize specifications according to customer equipment requirements. We provide professional technical support and rapid supply services, offering customers a reliable material foundation in the field of thin film deposition.
Molecular Formula: MnCo
Appearance: Silver-gray
Density: 8.0 g/cm³
Crystal Structure: Face-centered cubic (FCC)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
