ULPMAT

Magnesium Stannide

Chemical Name:
Magnesium Stannide
Formula:
Mg2Sn
Product No.:
125000
CAS No.:
1313-08-2
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
125000ST001 Mg2Sn 99.9% Ø 76.2mm x 6.35mm Inquire
Product ID
125000ST001
Formula
Mg2Sn
Purity
99.9%
Dimension
Ø 76.2mm x 6.35mm

Magnesium Stannide Sputtering Target Overview

Magnesium Stannide sputtering targets are high-purity intermetallic compound targets, possessing both excellent electrical conductivity and thermal stability. They are suitable for preparing functional metal thin films, thermoelectric materials, and electronic device films.

We offer Magnesium Stannide sputtering targets in various specifications, sizes, and purity grades to support industrial production and scientific research experiments. Please inquire now.

Product Highlights

High-purity intermetallic compound

Excellent electrical conductivity and thermal stability
High density, stable sputtering process
Customizable sizes and shapes
Smooth surface, suitable for high-precision thin film deposition
Meets the needs of both scientific research and industrial batch production

Applications of Magnesium Stannide Sputtering Targets

Functional Metal Thin Film Deposition: Can be used to prepare high-quality metal thin films, improving the performance of electronic devices and the uniformity of the film layer.
Thermoelectric Material Preparation: Suitable for film deposition in thermoelectric devices, helping to improve the thermoelectric conversion efficiency of devices.
Microelectronics and Sensor Components: Can be used for thin film deposition in electronic components and microsensors, ensuring the stability and consistency of the film layer.
Scientific Research and Pilot-Scale Applications: Supports laboratory and pilot-scale sputtering process research, facilitating the development and optimization of novel material thin films.

FAQs

Q1: Which sputtering processes is the Magnesium Stannide target suitable for?
A1: It can be used for both DC and RF sputtering, and is compatible with various industrial and scientific research equipment.

Q2: How does target density affect deposition results?
A2: High density reduces target particle shedding, ensuring a smooth and uniform film surface.

Q3: Can you customize sizes or shapes according to customer needs?
A3: Fully supported. Various shapes and sizes can be processed according to drawings or process requirements.

Q4: What precautions should be taken for target storage and use?
A4: It is recommended to store the target in a dry, sealed container. Keep the surface clean before use to ensure deposition quality.

Report

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request

Why Choose Us?

We specialize in the production of high-performance intermetallic compound sputtering targets, providing stable quality, customized specifications, and rapid response services to ensure the smooth implementation of our clients’ research and industrial production.

Molecular Formula: Mg₂Sn
Molecular Weight: 182.75 g/mol
Appearance: Silver-gray dense target
Density: 3.9–4.0 g/cm³ (depending on densification)
Melting Point: 770 °C
Crystal Structure: Cubic

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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