Magnesium silicide sputtering targets are compound targets composed of magnesium and silicon, suitable for thin film deposition processes requiring precise composition ratios and film consistency. They are primarily used in functional thin film preparation, materials surface engineering, and related device research.
We can process magnesium silicide sputtering targets of various sizes, thicknesses, and structures according to equipment requirements, supporting customization and stable supply. Please contact us directly for inquiries.
Compound sputtering target
Stable composition ratio
Dense structure, smooth sputtering
Good film repeatability
Controllable impurity content
Supports customization of various specifications
Functional Thin Film Deposition: Can be used to prepare silicon-magnesium related thin films with uniform composition, meeting the requirements for film stability.
Vacuum Deposition Process Development: In vacuum processes such as magnetron sputtering, this target is suitable for parameter tuning and process verification.
Surface Engineering and Structural Layer Research: By sputtering magnesium silicide targets, the surface structure and properties of materials can be controlled.
Research and Laboratory Applications: Widely used in thin film material research and new system exploration in universities and research institutions.
Q1: Which sputtering process is magnesium silicide sputtering target suitable for?
A1: Commonly used in vacuum deposition methods such as magnetron sputtering. Specific application depends on equipment configuration.
Q2: Is magnesium silicide target prone to decomposition during sputtering?
A2: Under appropriate power and vacuum conditions, it can maintain a stable sputtering state.
Q3: Can magnesium silicide sputtering targets be customized to non-standard sizes?
A3: Yes, we support customized processing according to target size and usage requirements.
Q4: Does this target require a backing plate?
A4: Whether a backing plate is required depends on the size and equipment requirements. We can provide corresponding suggestions.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We have experience in the formulation, sintering, and processing of compound sputtering targets, ensuring compositional consistency and operational stability, helping customers reduce sputtering commissioning time.
Molecular Formula: Mg₂Si
Molecular Weight: 56.38 g/mol
Appearance: Silver-gray dense target
Density: 1.99–2.05 g/cm³ (sintered target)
Melting Point: 1085 °C
Crystal Structure: Cubic (anti-zincblende structure)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
