ULPMAT

Lithium Titanium Oxide (Lithium Titanate) (LTO)

Chemical Name:
Lithium Titanium Oxide (Lithium Titanate) (LTO)
Formula:
Li4Ti5O12
Product No.:
03220801
CAS No.:
12031-95-7
EINECS No.:
619-916-2
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
03220801ST001 Li4Ti5O12 99.9% Ø 25.4mm x 3.175mm Inquire
Product ID
03220801ST001
Formula
Li4Ti5O12
Purity
99.9%
Dimension
Ø 25.4mm x 3.175mm

Lithium Titanium oxide sputtering target Overview

Lithium Titanium oxide sputtering targets are high-purity ceramic materials engineered for thin-film deposition processes in advanced battery research, electroceramics, and energy storage device development. Featuring excellent phase purity, uniform density, and stable sputtering performance, these targets enable the fabrication of high-quality thin films with precise stoichiometry and superior crystallinity.

Our Lithium titanate sputtering targets are manufactured using advanced sintering and hot-pressing techniques to ensure optimal density, minimal defects, and reproducible film deposition rates. We offer comprehensive after-sales support—please feel free to contact us if you have any questions.

Product Highlights

Purity: ≥99.9% (customizable upon request)
High density and uniform microstructure
Sizes and shapes tailored
Technical support for material selection

Applications of Lithium titanate Sputtering Targets

Battery Materials: Thin-film electrodes for lithium-ion and solid-state batteries
Electroceramics: Functional coatings in electronic and energy devices
Solid Electrolytes: Deposition of protective or interface layers in all-solid-state batteries

FAQs

Q1: What types of thin films is Lithium Titanium Oxide sputtering target mainly used for?
A1: This sputtering target is mainly used for preparing functional lithium titanium oxide thin films, commonly found in lithium battery-related materials, energy storage devices, and electronic functional layers research.

Q2: What are the characteristics of Lithium Titanium Oxide material in thin film research?
A2: This material system has good structural stability, making it suitable for studying the electrochemical behavior, interfacial properties, and long-term deposition consistency of thin films.

Q3: What deposition process conditions are suitable for this sputtering target?
A3: Lithium Titanium Oxide sputtering targets can be used in common PVD processes such as RF sputtering and are compatible with various experimental and pilot-scale sputtering equipment.

Q4: What aspects should be considered when using Lithium Titanium Oxide sputtering targets?
A4: Stable deposition results can be obtained under reasonable process parameters. It is recommended to optimize the process based on specific equipment conditions to ensure the repeatability and consistency of the thin films.

Reports

Each batch of Li4Ti5O12 is supplied with a Certificate of Analysis (COA) and Material Safety Data Sheet (MSDS).
Third-party analysis can be provided on request.
Optional XRD, SEM, and density reports upon request

Molecular Formula: Li₄Ti₅O₁₂
Molecular Weight: 458.63 g/mol
Appearance: Dense white or light gray solid target material
Density: 3.50 g/cm³
Melting Point: 1520 °C
Crystal Structure: Cubic

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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