Lithium oxide sputtering targets are used in advanced thin film deposition processes for producing lithium-containing coatings in solid-state batteries, transparent conductive films, and oxide semiconductors. With excellent reactivity and high lithium content, Li₂O targets serve as a lithium source in magnetron sputtering and PLD (pulsed laser deposition) systems.
Our lithium oxide sputtering targets are engineered from high-purity powder with typical purity ≥99.9%, sintered or hot-pressed to achieve high density and uniformity. We also offer comprehensive sales support—please feel free to contact us if you have any questions.
Purity: ≥99.9% (3N)
High lithium content for efficient doping or compound formation
Custom dimensions and bonding services available
Dense and uniform microstructure for stable sputtering rates
Purity Grades: 3N (99.9%) standard; 4N and higher available upon request
Target Shapes: Circular, rectangular, or custom geometries
Dimensions: Typical diameters 1″–8″, thickness 3–10 mm; customizable
Bonding: Optional bonding to backing plates (Cu, Mo) with indium or epoxy
Solid-State Lithium Batteries: Thin film deposition of lithium-rich solid electrolytes (e.g., LLZO, LISICON-type, LiPON)
Electrochromic Devices: For lithium-intercalated oxide films in smart window applications
Transparent Conductive Oxides: Doping agent for materials like ZnO and ITO to modify electronic properties
Functional Thin Films: Employed in the formation of lithium-containing oxide layers for advanced electronic devices
Q1: What types of thin films are Lithium Oxide sputtering targets mainly used for?
A1: These sputtering targets are mainly used for preparing lithium oxide functional thin films, commonly found in research fields such as lithium-based functional materials, solid electrolytes, and related oxide thin films.
Q2: What are the characteristics of Lithium Oxide materials during thin film deposition?
A2: This material exhibits typical oxide characteristics, which helps to form functional thin films with uniform composition and stable structure during sputtering deposition.
Q3: Which sputtering processes are suitable for this Lithium Oxide sputtering target?
A3: Lithium Oxide sputtering targets are generally suitable for PVD processes such as radio frequency sputtering, meeting the needs of thin film preparation in research and pilot-scale stages.
Q4: What precautions should be taken when using and storing Lithium Oxide sputtering targets?
A4: It is recommended to install and store the target in a dry, sealed environment to minimize contact with air and moisture, ensuring the stability of the sputtering process and the quality of the thin film.
All Li₂O sputtering targets are delivered with a Certificate of Analysis (COA) and Material Safety Data Sheet (MSDS). XRD, SEM, and EDX reports can be provided upon request.
Molecular Formula: Li₂O
Molecular Weight: 29.88 g/mol
Appearance: White target material
Density: 2.013 g/cm³
Melting Point: 1432 °C
Crystal Structure: Antifluorite structure (cubic crystal system)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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