ULPMAT

Lithium Silicate

Chemical Name:
Lithium Silicate
Formula:
Li4SiO4
Product No.:
03140801
CAS No.:
13453-84-4
EINECS No.:
236-634-1
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
03140801ST001 Li4SiO4 99.9% Ø 50.8mm x 3.175mm Inquire
Product ID
03140801ST001
Formula
Li4SiO4
Purity
99.9%
Dimension
Ø 50.8mm x 3.175mm

Lithium orthosilicate sputtering target Overview

Lithium orthosilicate sputtering targets are advanced ceramic materials widely used for thin film deposition in energy and nuclear applications. Li4SiO4 is known for its excellent thermal stability, good ionic conductivity, and high lithium content.

We offer customizable lithium orthosilicate sputtering targets in various purities, sizes, and shapes to meet specific research or industrial requirements. We also offer comprehensive support—please feel free to contact us.

Product Highlights

Typically Purity ≥99.9%
High Density and Uniform Microstructure
Customizable Sizes and Shapes: Available in circular, rectangular, or other shapes.
Optional Tailored Compositions: We can adjust stoichiometry or add dopants according to your specific application requirements.

Applications of Lithium orthosilicate Powder

Nuclear Fusion: Li₄SiO₄ is a leading ceramic breeder material for tritium production in fusion reactor blankets.
Solid-State Lithium Batteries: As a lithium-rich component in solid electrolyte or interfacial layers for improved ionic conductivity.
Hydrogen and Isotope Storage: Applied in ceramic composites for safe storage and controlled release of hydrogen isotopes.

FAQs

Q1: What types of thin films is the Lithium Orthosilicate sputtering target mainly used for?
A1: This target is mainly used for preparing lithium silicate functional thin films, commonly used in research on lithium battery materials, ceramic functional layers, and energy-related thin films.

Q2: What are the characteristics of Lithium Orthosilicate material in thin film preparation?
A2: This material has good chemical and structural stability, enabling the formation of uniform and controllable thin film structures during sputtering.

Q3: Which deposition processes is this sputtering target suitable for?
A3: The Lithium Orthosilicate sputtering target can be used in common PVD processes such as RF sputtering and DC sputtering, and is compatible with various experimental and pilot-scale equipment.

Q4: What precautions should be taken when using and storing the Lithium Orthosilicate sputtering target?
A4: It is recommended to store and handle it in a dry, sealed environment, avoiding prolonged exposure to air to ensure the stability and repeatability of the target during the deposition process.

Reports

Each batch of Li4SiO4 is supplied with a Certificate of Analysis (COA) and Material Safety Data Sheet (MSDS).
Third-party elemental purity and phase composition analysis can be provided on request.
Optional XRD patterns and particle size analysis upon request

Molecular Formula: Li₄SiO₄
Molecular Weight: 119.85 g/mol
Appearance: Dense white solid target material
Density: 2.39 g/cm³
Melting Point: 1256 °C
Crystal Structure: Monoclinic

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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