Lithium Niobium oxide substrates are highly stable functional material substrates suitable for thin film growth and electronic device manufacturing. They are widely used in lithium-ion battery research, optoelectronic devices, and functional coating deposition.
We offer LNO substrates in various sizes and thicknesses, with smooth surfaces and selectable crystal orientations to meet the needs of research and industrial applications. Contact us now for samples and customized solutions!
Controllable crystal orientation, beneficial for thin film growth
Smooth surface, low defect rate
Customizable size and thickness
High thermal stability, suitable for high-temperature processes
Supports research and industrial applications
Rapid response from our technical team
Thin Film Deposition: LNO substrates are used in thin film preparation processes such as magnetron sputtering, PLD, and CVD to ensure film uniformity and crystallinity quality.
Lithium-ion Battery Research: As a functional substrate, it supports the deposition and performance testing of high-performance electrode materials.
Optoelectronic and Microelectronic Devices: Providing crystal-oriented, flat substrates suitable for the growth of sensors, optical devices, and microelectronic structures.
Q1: What crystal orientation options are available for LNO substrates?
A1: Multiple crystal orientations are available, such as (001), (110), etc., selected according to experimental requirements.
Q2: Can the substrate size and thickness be customized?
A2: Yes, we can provide various specifications according to customer equipment requirements.
Q3: What is the surface roughness of the LNO substrate?
A3: The surface is precision polished, with a roughness below the nanometer level, suitable for high-precision thin film deposition.
Q4: Can it be used for high-temperature thin film processes?
A4: Suitable for high-temperature processing, with high material stability, ensuring stable thin film growth.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We have many years of experience in functional material substrate production. Our products have smooth surfaces and controllable crystal orientations, supporting scientific research and industrial applications. Our technical team can provide customized solutions and rapid response to help customers efficiently complete thin film deposition and device fabrication.
Molecular weight: 147.85 g/mol
Appearance: Colorless and transparent or slightly tinted single crystal/polished wafer
Density: 4.64 g/cm³
Melting point: 1253 °C
Crystal structure: Trigonal
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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