ULPMAT

Lithium Nickel Phosphate

Chemical Name:
Lithium Nickel Phosphate
Formula:
LiNiPO4
Product No.:
0328150800
CAS No.:
13977-83-8
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
0328150800ST001 LiNiPO4 99.9% Ø 50.8mm x 3.175mm Inquire
0328150800ST002 LiNiPO4 99.99% Ø 50.8mm x 6.35mm Inquire
Product ID
0328150800ST001
Formula
LiNiPO4
Purity
99.9%
Dimension
Ø 50.8mm x 3.175mm
Product ID
0328150800ST002
Formula
LiNiPO4
Purity
99.99%
Dimension
Ø 50.8mm x 6.35mm

Overview of Lithium Nickel Phosphate Sputtering Targets

LiNiPO₄ sputtering targets are high-density, highly uniform functional material targets used in thin film preparation and scientific research. They are widely used in lithium-ion battery cathode films, solid-state batteries, and functional coating deposition.

We can provide high-density, highly uniform LiNiPO₄ sputtering targets. Size, thickness, and shape can be customized to customer requirements. Contact us for samples or customized solutions!

Product Highlights

High density ensures uniform film deposition
Stable crystal structure ensures reliable deposition results
Customizable size, thickness, and shape
Supports research and industrial thin film preparation
Fine surface finishing, low defect rate
Rapid response from our technical team

Applications of Lithium Nickel Phosphate Sputtering Targets

Thin Film Cathode Material Preparation: Used for high-performance lithium-ion battery cathode film deposition, improving electrochemical performance and cycle stability.
Solid-State Battery Research: Supports all-solid-state battery thin film deposition, ensuring interface uniformity and ionic conductivity.
Functional Coating Deposition: Used for high-precision thin film fabrication in optoelectronic devices, sensors, and microelectronic structures, ensuring dense and uniform films.

FAQs

Q1: What power sputtering equipment is suitable for the LiNiPO₄ target?
A1: The target is compatible with conventional low-to-medium power and high-power magnetron sputtering equipment, ensuring uniform film deposition.

Q2: Is the target stable in high-temperature deposition processes?
A2: The target has a stable crystal structure, making it suitable for high-temperature deposition processes without significant decomposition or structural changes.

Q3: Can you provide targets of different shapes and sizes?
A3: Yes, we can provide circular, square, and custom-sized targets according to equipment requirements.

Q4: What types of thin films is the target suitable for deposition?
A4: Suitable for deposition of cathode material thin films, functional ceramic thin films, and microelectronic and optical functional thin films.

Report

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request

Why Choose Us?

We have many years of experience in functional materials sputtering target production, providing customized, high-quality LiNiPO₄ sputtering targets to ensure the stability and efficiency of thin film deposition in scientific research and industrial applications. Our technical team provides rapid response and professional support to help customers achieve high-precision thin film preparation.

Molecular Formula: LiNiPO₄
Molecular Weight: 184.63 g/mol
Appearance: Dark-colored, dense solid target material
Density: 3.90 g/cm³
Crystal Structure: Orthorhombic crystal system

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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