ULPMAT

Lithium Nickel Oxide

Chemical Name:
Lithium Nickel Oxide
Formula:
LiNiO2
Product No.:
03280800
CAS No.:
12031-65-1
EINECS No.:
620-400-4
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
03280800ST001 LiNiO2 99.9% Ø 25.4mm x 6.35mm Inquire
Product ID
03280800ST001
Formula
LiNiO2
Purity
99.9%
Dimension
Ø 25.4mm x 6.35mm

Lithium Nickel Oxide Sputtering Target Overview

LNO sputtering targets are high-density, high-uniformity functional material targets used in thin film preparation and scientific research experiments. They are widely used in lithium-ion battery cathode films, solid-state batteries, and optoelectronic and functional coating deposition.

We can provide high-density, high-uniformity LNO sputtering targets; size, thickness, and shape can be customized to customer requirements. Contact us for samples or customized solutions!

Product Highlights

High density ensures uniform film deposition
Stable crystal structure ensures reliable film deposition results
Customizable size, thickness, and shape
Supports research and industrial thin film preparation
Fine surface finishing, low defect rate
Rapid response from our technical team

Applications of Lithium Nickel Oxide Sputtering Targets

Thin Film Cathode Material Preparation: Used for high-performance lithium-ion battery cathode film deposition, improving cycle stability and electrochemical performance.
Solid-State Battery Research: Supports all-solid-state battery thin film deposition, ensuring interface uniformity and ionic conductivity.
Optoelectronics and Functional Coatings: High-precision thin film fabrication for sensors, optical devices, and microelectronic structures, ensuring dense and uniform films.

FAQs

Q1: Which deposition processes are suitable for LNO sputtering targets?
A1: Suitable for magnetron sputtering, electron beam evaporation, and other conventional PVD processes.

Q2: Can the target size and thickness be customized?
A2: Yes, various specifications are available according to customer equipment requirements.

Q3: How is the uniformity of the deposited film?
A3: The target’s density and optimized crystal structure ensure high film uniformity and crystal quality.

Q4: Is the target surface defect rate high?
A4: The target surface undergoes precision polishing, resulting in a low defect rate, suitable for high-precision thin film fabrication.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request

Why Choose Us?

With years of experience in functional material sputtering target production, we can provide customized, high-quality LNO sputtering targets to ensure the stability and efficiency of thin film deposition in scientific research and industrial applications. Our technical team offers rapid response and professional support to help customers achieve high-precision thin film preparation.

Molecular Formula: LiNiO₂
Molecular Weight: 97.68 g/mol
Appearance: Black or dark gray dense solid target
Density: 4.78 g/cm³
Crystal Structure: Hexagonal

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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