ULPMAT

Lithium Nickel Cobalt Oxide

Chemical Name:
Lithium Nickel Cobalt Oxide
Formula:
LiNiCoO2
Product No.:
0328270800
CAS No.:
113066-89-0
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
0328270800ST001 LiNiCoO2 99.99% Ø 50.8mm x 3.175mm Inquire
0328270800ST002 LiNiCoO2 99.99% Ø 76.2mm x 3.175mm Inquire
Product ID
0328270800ST001
Formula
LiNiCoO2
Purity
99.99%
Dimension
Ø 50.8mm x 3.175mm
Product ID
0328270800ST002
Formula
LiNiCoO2
Purity
99.99%
Dimension
Ø 76.2mm x 3.175mm

Lithium Nickel Cobalt Oxide Sputtering Targets Overview 

Lithium Nickel Cobalt Oxide sputtering targets are high-density, high-uniformity functional material targets used in thin film preparation and scientific research experiments. They are widely used in lithium-ion battery cathode films, solid-state batteries, and functional coating deposition.

We can provide high-density, high-uniformity NMC sputtering targets; sizes, thicknesses, and shapes can all be customized to customer requirements. Contact us for samples or customized solutions!

Product Highlights

High density ensures uniform film deposition
Stable crystal structure ensures reliable deposition results
Customizable size, thickness, and shape
Supports research and industrial thin film preparation
Fine surface finishing, low defect rate
Rapid response from our technical team

Applications of Lithium Nickel Cobalt Oxide Sputtering Targets

Thin Film Cathode Material Preparation: Used for high-performance lithium-ion battery cathode film deposition, improving cycle stability and electrochemical performance.
Solid-State Batteries: Supports all-solid-state battery thin film deposition, ensuring interface uniformity and ionic conductivity.
Functional Coatings: Used for high-precision thin film fabrication in optoelectronic devices, sensors, and microelectronic structures, ensuring dense and uniform films.

FAQs

Q1: Which deposition processes are suitable for NMC sputtering targets?
A1: Suitable for magnetron sputtering, electron beam evaporation, and other conventional PVD processes.

Q2: Can the target size and thickness be customized?
A2: Yes, various specifications are available according to customer equipment requirements.

Q3: How is the uniformity of the deposited film?
A3: The target’s density and optimized crystal structure ensure high film uniformity and crystal quality.

Q4: Is the target surface defect rate high?
A4: The target surface is precision polished, resulting in a low defect rate, suitable for high-precision thin film fabrication.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request

Why Choose Us?

With years of experience in functional materials sputtering target production, we can provide customized, high-quality NMC sputtering targets to ensure the stability and efficiency of thin film deposition in scientific research and industrial applications. Our technical team offers rapid response and professional support to help customers achieve high-precision thin film preparation.

Molecular formula: LiNiCoO2
Appearance: Black or dark gray dense solid target
Crystal structure: Hexagonal crystal system

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

Documents

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