ULPMAT

Lithium Manganese Phosphate

Chemical Name:
Lithium Manganese Phosphate
Formula:
LiMnPO4
Product No.:
0325150800
CAS No.:
13826-59-0
EINECS No.:
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
0325150800ST001 LiMnPO4 99.9% Ø 25.4mm x 3.175mm Inquire
0325150800ST002 LiMnPO4 99.9% Ø 25.4mm x 6.35mm Inquire
Product ID
0325150800ST001
Formula
LiMnPO4
Purity
99.9%
Dimension
Ø 25.4mm x 3.175mm
Product ID
0325150800ST002
Formula
LiMnPO4
Purity
99.9%
Dimension
Ø 25.4mm x 6.35mm

Lithium Manganese Phosphate Sputtering Targets Overview 

Lithium Manganese Phosphate sputtering targets are high-purity lithium-ion battery cathode material targets used for thin film preparation and scientific research experiments. They enable uniform thin film deposition and are widely used in power battery research, solid-state batteries, and functional coatings.

We can provide high-density, high-uniformity Lithium Manganese Phosphate sputtering targets; dimensions and thicknesses can be customized to customer requirements. Contact us for samples or customized solutions!

Product Highlights

High purity, low impurities
High density and mechanical strength
Stable crystal structure, excellent thin film uniformity
Customizable size, shape, and thickness
Supports scientific research and industrial applications
Rapid technical support response

Applications of Lithium Manganese Phosphate Sputtering Targets

Power Battery Research: Used to prepare LMP thin film cathode materials for high-performance battery development.
Solid-State Batteries: Supports all-solid-state battery thin film deposition, ensuring interface uniformity and ionic conductivity.
Functional Coatings: Can be used for high-precision thin film preparation in optoelectronics, microelectronics, and other fields.

FAQs

Q1: Which deposition processes are suitable for Lithium Manganese Phosphate sputtering targets?
A1: Suitable for conventional PVD processes such as magnetron sputtering and electron beam evaporation.

Q2: Can the target size and thickness be customized?
A2: Yes, various specifications are available according to customer equipment requirements.

Q3: How is the uniformity of the sputtered film?
A3: Target density and optimized crystal structure enable highly uniform film deposition.

Q4: What are the purity and impurity control requirements for the target?
A4: Purity up to 99.9%, with strict control over metal impurities and oxygen content.

Reports

Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request

Why Choose Us?

We have professional target production equipment and technical team, and can provide customized, high-quality LMP sputtering targets to ensure stable and efficient thin film deposition results in scientific research and industrial applications.

Molecular Formula: LiMnPO₄
Molecular Weight: 156.85 g/mol
Appearance: Dark gray dense solid target material
Density: 3.50 g/cm³
Crystal Structure: Orthorhombic crystal system

Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.

Outer Packaging: Cartons or wooden crates selected based on size and weight.

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