Lithium Manganese Oxide sputtering targets are ceramic targets designed for thin-film deposition of LMO cathode layers. With high rate capability, thermal stability, and structural robustness, LMO targets are widely used in the research and development of micro-scale lithium-ion batteries, thin-film energy storage devices, and advanced electrochemical materials.
Lithium Manganese Oxide sputtering targets are manufactured with controlled stoichiometry, dense ceramic structure, and high phase purity to ensure uniform sputtering rates, reproducible thin-film composition, and stable electrochemical performance. They are compatible with RF and magnetron sputtering systems used in thin-film solid-state battery research.
Spinel-type LiMn₂O₄ structure with high structural stability
Dense ceramic structure for uniform and stable sputtering
Controlled stoichiometry ensuring reproducible thin-film properties
Compatible with RF and magnetron sputtering systems
Suitable for microbattery and thin-film lithium-ion research
Good adhesion and substrate compatibility
Thin-Film Cathodes for Microbatteries：LMO targets are used to deposit cathode layers in micro-scale lithium-ion batteries.
Energy Storage Research & Development：Thin films from LMO targets are applied in studies of electrochemical performance, cycling stability, and interface engineering.
Electrochemical Materials Research：LMO targets support advanced research in solid-state cathodes, composite electrodes, and functional thin-film materials.
Functional Coatings for Energy Devices：Used in developing thin-film cathode coatings for microbatteries and other energy storage applications.
Q1: Which sputtering methods are suitable for Lithium Manganese Oxide targets?
A1: LMO targets are commonly used in RF and magnetron sputtering systems due to their ceramic nature.
Q2: Can LMO thin films maintain lithium and manganese content during sputtering?
A2: Proper target design and optimized sputtering parameters ensure minimal loss and consistent thin-film composition.
Q3: Are Lithium Manganese Oxide targets compatible with backing plates?
A3: Yes, bonding options can be provided depending on target size and sputtering system requirements.
Q4: Which substrates are compatible with LMO thin films?
A4: Common substrates include silicon wafers, glass, sapphire, and other materials used in thin-film battery research.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
Lithium Manganese Oxide sputtering targets are frequently searched for thin-film cathodes, microbattery research, and energy storage applications. Their dense ceramic structure, controlled stoichiometry, and compatibility with RF/magnetron sputtering systems support strong technical visibility and Google search relevance.
Molecular Formula: LiMn₂O₄
Molecular Weight: 180.82 g/mol
Appearance: Black, dense solid target material
Density: 4.28 g/cm³
Crystal Structure: Cubic
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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