Lithium Aluminium Cobalt Oxide sputtering targets are functional ceramic targets used to prepare lithium-cobalt-based composite oxide thin films, balancing structural stability and electrochemical performance. They are primarily used in research on lithium-ion battery-related thin films, electrochemical functional layers, and novel energy materials.
We can provide LixAlyCo₁₋yO₂ sputtering targets with adjustable composition ratios, compatible with various deposition processes. Please contact us directly for technical information and solution support.
Lithium-cobalt-based composite oxide system
Aluminum element introduction for more stable structure
Suitable for uniform thin film deposition
Controllable chemical composition
High target density
Compatible with various sputtering equipment
Lithium-ion battery thin film material research: Commonly used to prepare lithium-ion battery-related functional thin films, and to study the electrochemical behavior of thin film cathode materials under different structural and compositional conditions.
Solid-state and thin-film batteries: In the fields of solid-state and thin-film batteries, this sputtering target can be used to deposit active or functional layers, improving the uniformity and structural stability of the film.
Functional oxide film preparation: This material is suitable for physical vapor deposition (PVD) of functional oxide films, exhibiting good adaptability in energy storage and electronic device research.
Materials science and university research: Widely used in research institutions and university laboratories for the composition control and performance research of novel lithium-based oxide films.
Q1: What types of thin films is the Lithium Aluminium Cobalt Oxide sputtering target mainly used for?
A1: This target is mainly used for depositing lithium cobalt-based composite oxide thin films, commonly found in electrochemical and energy materials research.
Q2: What is the effect of introducing aluminum on the thin film?
A2: Aluminum helps improve the structural stability of the material and, to some extent, enhances the uniformity of the film during deposition and use.
Q3: What sputtering methods is this sputtering target suitable for?
A3: It can be used in common PVD processes such as DC sputtering and RF sputtering, adaptable to various equipment conditions.
Q4: Is the target material stable during sputtering?
A4: This material system exhibits good sputtering stability under appropriate process conditions, making it suitable for continuous or repeated deposition experiments.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Third-party testing reports available upon request
We specialize in the preparation and application of lithium-based and transition metal oxide sputtering targets. We can provide target solutions with tunable composition and stable performance to meet different research and process requirements, helping customers improve the controllability and repeatability of thin film preparation.
Molecular Formula: LixAlyCo1-yO2
Appearance: Black or dark gray dense solid target
Crystal Structure: Hexagonal crystal system (layered structure, R-3m space group)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
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