Lanthanum Manganese Aluminum Oxide sputtering targets are high-performance materials designed for advanced thin film deposition processes. The material has excellent chemical purity and a dense microstructure, ensuring uniform film formation, strong adhesion and extremely low impurity content, meeting the stringent requirements of high-end electronics and optics.
We offer Lanthanum Manganese Aluminum Oxide sputtering targets in a variety of shapes and sizes, including round and rectangular, and support customized specifications according to customer needs. Whether for scientific research or industrial production, we can provide a full range of technical support and after-sales service to ensure the smooth progress of your project.
Product highlights:
High purity, meeting the strict standard of 99.9%
Excellent density, ensuring uniform deposition of thin films
Flexible customization of size and shape to meet diverse process requirements
Provide target binding services
Widely used in semiconductor devices, magnetic storage, optical components and functional coatings
Applications
Semiconductors: used to manufacture functional thin film layers in high-performance electronic devices
Magnetic storage: Preparation of magnetic films to achieve high-density data storage
Optical devices: Form high-quality functional coatings on lenses and reflectors
Functional coatings: used in sensors and other advanced materials
Reports
Each batch of products comes with a certificate of analysis (COA), material safety data sheet (MSDS) and related quality reports. At the same time, we support third-party testing to ensure that product quality meets the highest industry standards.
Molecular formula: LaMn₀.₂Al₀.₈O₃
Molecular weight: about 190.00 g/mol
Appearance: gray-white dense ceramic target, smooth surface
Density: ≥ 5.0 g/cm³ (dense sintered body)
Melting point: about 1,500 °C (ceramic material)
Solubility: insoluble in water and conventional organic solvents
Conductivity: solid state exhibits semiconductor properties
Thermal stability: stable at high temperature, suitable for high temperature process environment
Thermal expansion coefficient: about 8 × 10⁻⁶ K⁻¹ (suitable for thin film deposition process)
Crystal structure: orthorhombic system
Magnetic properties: paramagnetic, stable magnetic properties
Chemical stability: chemically inert, acid and alkali corrosion resistant, suitable for a variety of atmosphere environments
Corrosion resistance: long-term stability in oxidizing and inert atmospheres
Mechanical properties: dense ceramic structure, high mechanical strength, suitable for sputtering process
Inner packaging: Vacuum-sealed bag to protect against contamination and moisture.
Outer packaging: Carton or wooden box, depending on size and weight.
Fragile targets: Special protective packaging is used to ensure safe transport.
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