ULPMAT

Lanthanum Fluoride

Chemical Name:
Lanthanum Fluoride
Formula:
LaF3
Product No.:
570900
CAS No.:
13709-38-1
EINECS No.:
237-252-8
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Inquiry
570900ST001 LaF3 99.995% (REO) Ø 203.2 mm x 6.35 mm Inquire
570900ST002 LaF3 99.998% (REO) Ø 76.2 mm x 6.35 mm Inquire
570900ST003 LaF3 99.998% (REO) Ø 101.6 mm x 3.175 mm Inquire
Product ID
570900ST001
Formula
LaF3
Purity
99.995% (REO)
Dimension
Ø 203.2 mm x 6.35 mm
Product ID
570900ST002
Formula
LaF3
Purity
99.998% (REO)
Dimension
Ø 76.2 mm x 6.35 mm
Product ID
570900ST003
Formula
LaF3
Purity
99.998% (REO)
Dimension
Ø 101.6 mm x 3.175 mm

Lanthanum fluoride sputtering target Overview

Lanthanum fluoride sputtering targets are high-performance fluoride materials designed for advanced thin film deposition processes and are widely used in optics, electronics, lasers, and vacuum coating. Lanthanum fluoride has excellent optical transparency, electrical insulation, and thermal stability, and can form uniform, high-density functional films. We provide high-purity lanthanum fluoride sputtering targets from laboratory research grade to industrial mass production grade to ensure your process is stable and efficient.

We provide lanthanum fluoride sputtering targets in a variety of shapes and sizes, including round, rectangular, and ring-shaped, which can be customized according to your equipment and process requirements. At the same time, we also provide comprehensive pre-sales consultation and after-sales technical support – whether you are in the early stages of R&D or mass production, we will be your trusted material partner.

Product highlights

Purity: 99.995% to 99.998%
Excellent optical performance: Suitable for a wide spectral range from infrared to ultraviolet
Excellent electrical insulation and thermal stability
Customizable shape and size, compatible with a variety of sputtering systems
Target binding service available
Suitable for functional film deposition of complex structures

Applications of Lanthanum fluoride sputtering target

Optical coating: LaF3 has a low refractive index and excellent infrared transmittance, and is commonly used in coating systems such as optical lenses, laser windows, and interference filters.
Vacuum ultraviolet (VUV) and deep ultraviolet (DUV) optics: Used for thin film deposition of high-transmittance window materials in space telescopes and ultraviolet light sources.
Electronic thin film components: Provide good dielectric properties and chemical stability in capacitors, insulating layers, and microelectronic components.
Infrared sensing and protective coatings: LaF3 films can be used as anti-reflective coatings or protective layers to improve device life and signal efficiency.

Reports

We provide Certificate of Analysis (COA), Material Safety Data Sheet (MSDS) and other related reports for each batch of goods. In addition, we support third-party testing for enhanced quality assurance.

Molecular formula: LaF₃
Molecular weight: 195.90 g/mol
Appearance: White or light gray
Density: About 5.94 g/cm³
Melting point: About 1,490 °C
Thermal conductivity: About 4.1 W/m·K
Specific heat capacity: About 0.37 J/g·K
Coefficient of thermal expansion: About 13.2 × 10⁻⁶ /K

Inner packaging: Vacuum-sealed bag to protect against contamination and moisture.

Outer packaging: Carton or wooden box, depending on size and weight.

Fragile targets: Special protective packaging is used to ensure safe transport.

SKU 570900ST Category Tags: Brand:

Documents

No PDF files found.

Contact Us

If you need any service, please contact us

More Information

more products

CONTACT US

Thermal Spray

Our website has been completely upgraded