Iron silicon boron sputtering targets are a key material used in physical vapor deposition (PVD) to prepare amorphous, nanocrystalline, or specialized functional thin films. Due to their unique soft magnetic properties, wear and corrosion resistance, and magnetostrictive effect, these materials are widely used in cutting-edge fields such as precision electronic devices, sensors, energy efficiency, and surface protection.
We offer high-purity, high-density iron silicon boron sputtering targets, customizable to different composition ratios, sizes, and purity grades to meet your requirements. We support various advanced processes such as hot isostatic pressing and vacuum melting to ensure excellent performance and batch stability. Please contact us for detailed product specifications or the latest pricing.
Precise composition, adjustable performance
High purity, strict impurity control
High density, uniform and fine grains
Stable sputtering rate, excellent film quality
Long service life, high cost-effectiveness
Custom sizes and shapes supported
High-performance magnetic sensors and electronic components: Used to prepare amorphous or nanocrystalline soft magnetic thin films. These films possess excellent properties such as high permeability and low loss, making them core functional layers for manufacturing high-frequency transformers, inductors, magnetic sensors, and magnetostrictive sensors.
Surface strengthening and protective coatings: The iron-silicon-boron-based thin film coatings formed by sputtering have high hardness, good wear resistance, and corrosion resistance, significantly improving the service life of precision parts, tools, molds, etc., in high-wear or corrosive environments.
Advanced storage and semiconductor technology: Under specific composition and structure, they can be used to develop functional thin film layers in novel magnetic recording media or semiconductor devices, meeting the higher requirements for material performance in the information technology field.
Cutting-Edge Scientific Research and Functional Exploration: As an important research material, it serves fundamental scientific research and innovative application development in novel magnetic materials, spintronics, thermoelectric devices, and other fields, providing a material foundation for technological breakthroughs.
Q1: How do I determine the appropriate composition and specifications of the sputtering target I need?
A1: The specific choice of target depends primarily on your final thin film performance requirements and the model of sputtering equipment you will be using. Our technical engineers can recommend the most suitable composition and specifications based on your application goals and process conditions.
Q2: How long does it take to customize a target with a special size or composition?
A2: The customization cycle depends on the complexity of the specific process, typically several weeks. For adjustments to standard alloy compositions or dimensional modifications, we will try to shorten the delivery time. Please provide your specific requirements, and we will assess them and provide an accurate delivery date.
Q3: How do you guarantee the quality and batch consistency of your targets?
A3: We start with raw material control and employ standardized and precise production and testing processes throughout the entire process. Each batch of targets comes with a detailed quality inspection report to ensure that the chemical composition, physical properties, and microstructure meet your requirements.
Q4: Besides the sputtering target itself, can you provide related usage guidance?
A4: Yes. We can provide basic operating guidelines for the installation, cleaning, and storage of sputtering targets to help you optimize your processes and better utilize the product.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We have deep expertise in the high-end sputtering target field, possessing not only full-chain technical capabilities from material design to precision manufacturing, but also a profound understanding of the importance of stable and reliable materials for our customers’ R&D and production. We are committed to providing you with high-performance, highly consistent iron-silicon-boron sputtering targets through rigorous process control and professional technical services, becoming your trusted material partner.
Molecular Formula: FeSiB
Appearance: Grayish-black
Crystal Structure: Amorphous
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
