Iron Nickel Alloy sputtering targets are functional targets based on an iron-nickel alloy system, primarily used for the preparation of magnetic thin films, electronic materials, and related functional coatings.
We offer iron-nickel alloy sputtering targets in various composition ratios and sizes to meet diverse deposition process requirements. Please contact us to confirm technical parameters.
Controllable Composition Ratio
Stable Magnetic Properties
Uniform Structure
Compatible with Multiple PVD Deposition Processes
Custom Sizes and Alloy Ratios Supported
Stable Supply
Magnetic Thin Film Materials: Iron-nickel alloys are commonly used to prepare soft magnetic or functional magnetic thin films, suitable for sensor, magnetic recording, and related device research and manufacturing.
Electronic and Semiconductor Materials: In electronic components and semiconductor processes, these alloy targets can be used for metal or functional layer deposition, improving the consistency of thin film performance.
Functional Coatings and Surface Engineering: Depositing iron-nickel alloy thin films via sputtering can improve material surface structure or achieve specific functional properties.
Scientific Research and Laboratory Applications: Suitable for fundamental research in universities and research institutions on alloy thin films, growth mechanisms, and process optimization.
Q1: Is DC or RF sputtering suitable for iron-nickel alloy sputtering targets?
A1: DC or RF sputtering can be selected based on the specific alloy composition and equipment conditions.
Q2: Can the iron to nickel ratio in the alloy be adjusted?
A2: Yes, customized production with different iron-nickel ratios is supported according to application requirements.
Q3: Is the Iron Nickel Alloy alloy sputtering target stable during long-term sputtering?
A3: Under reasonable process parameters, the target sputtering process is stable, which helps to obtain uniform thin films.
Q4: Is the Iron Nickel Alloy alloy sputtering target more suitable for scientific research or industrial applications?
A4: It can meet the needs of scientific research experiments and is also suitable for some pilot-scale and industrial applications.
Each batch is supplied with:
Certificate of Analysis (COA)
Technical Data Sheet (TDS)
Material Safety Data Sheet (MSDS)
Size Inspection Report
Third-party testing reports available upon request
We have long focused on the research and supply of metal and alloy sputtering targets, emphasizing composition control, processing consistency, and technical response efficiency. We can provide reliable and sustainable material support for magnetic materials and electronic thin film projects.
Molecular Formula: FeNi
Appearance: Silver-gray
Density: 8.7 g/cm³
Crystal Structure: Face-centered cubic (FCC)
Inner Packaging: Vacuum-sealed bags and boxed to prevent contamination and moisture.
Outer Packaging: Cartons or wooden crates selected based on size and weight.
If you need any service, please contact us
